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MOS Inverters: Static Characteristics: Digital Integrated Circuits

The document discusses MOS inverters. It describes the basic structure of an nMOS inverter with a resistive load and its voltage transfer characteristic (VTC). Key points include input/output voltages (VIH, VIL, VOH, VOL), noise margins, power consumption, and chip area considerations. Depletion-load nMOS inverters are introduced as having advantages over resistive-load and enhancement-load inverters, including better noise margins and reduced leakage current.

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0% found this document useful (0 votes)
199 views37 pages

MOS Inverters: Static Characteristics: Digital Integrated Circuits

The document discusses MOS inverters. It describes the basic structure of an nMOS inverter with a resistive load and its voltage transfer characteristic (VTC). Key points include input/output voltages (VIH, VIL, VOH, VOL), noise margins, power consumption, and chip area considerations. Depletion-load nMOS inverters are introduced as having advantages over resistive-load and enhancement-load inverters, including better noise margins and reduced leakage current.

Uploaded by

Prasad M Prasad
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
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Download as PDF, TXT or read online on Scribd
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CMOS

Digital Integrated
Circuits
Analysis and Design

Chapter 5
MOS Inverters:
Static Characteristics
1
Introduction
• Positive logic convention
– “1” represents high voltage of
VDD
– “0” represents low voltage of 0

• The inverter threshold voltage,


Vth
– The input voltage,
0<Vin<VthBoutput VDD
– The input voltage,
Vth<Vin<VDDBoutput 0

2
General circuit structure of an nMOS inverter
• The driver transistor
– The input voltage
Vin=VGS
– The output voltage
Vout=VDS
– The source and the
substrate are ground,
VSB=0
• The load device
– Terminal current IL,
terminal voltage VL

3
Voltage transfer characteristic (VTC)
• The VTC describing Vout as a function of Vin under DC condition
• Very low voltage level
– Vout=VOH
– nMOS off, no conducting current, voltage drop across the load is very
small, the output voltage is high
• As Vin increases
– The driver transistor starts conducting,
the output voltage starts to decrease
– The critical voltage point, dVout/dVin=-1
• The input low voltage VIL
• The input high voltage VIH
• Determining the noise margins
• Further increase Vin
– Output low voltage VOL, when the input
voltage is equal to VOH
– The inverter threshold voltage Vth
• Define as the point where Vin=Vout

4
Noise immunity and noise margin

• NML=VIL-VOL
• NMH=VOH-VIH
• The transition region, uncertain
region

5
Power and area consideration
• The DC power dissipation
– The product of its power supply voltage and the
amount of current down from the power supply during
steady state or in standby mode
– PDC=VDDIDC=(VDD/2)[IDC(Vin=low)+IDC(Vin=high)]
– In deep submicron technologies
• Subthreshold current Bmore power consumption
• The chip area
– To reduce the area of the MOS transistor
• The gate area of the MOS transistor
• The product of W and L

6
Resistive-load inverter
• Operation mode
– Vin<VT0, cut off
• No current, no voltage drop
across the load resistor
• Vout=VDD
– VT0≤Vin<Vout+VT0, saturation
• Initially, VDS>Vin-VT0
• I = k n ⋅ (V − V )2
R in T0
2
• With Vin↑B Vout↓
– Vin≥Vout+VT0, linear
• The output voltage
continues to decrease
[
• I R = k n ⋅ 2 ⋅ (Vin − VT 0 ) ⋅Vout − Vout
2
2
]

7
Calculation of VOH, VOL
• Calculation of VOH
– Vout=VDD-RLIR
– When Vin is low ⇒ID=IR=0 ⇒VOH=VDD
• Calculation of VOL
– Assume the input voltage is equal to VOH
– Vin-VT0≥Vout ⇒ linear region
– VDD − Vout
IR =
RL
Using KCL for the output node, i.e. I R = I D
VDD − VOL k n
RL
[
= ⋅ 2 ⋅ (VDD − VT 0 ) ⋅V0 L − V02L
2
]
 1  2
V02L − 2 ⋅ VDD − VT 0 +  ⋅ V0 L + ⋅ VDD = 0
 k n L 
R k R
n L

2
1  1  2VDD
V0 L = VDD − VT 0 + − VDD − VT 0 +  −
k n RL  k n L 
R k n RL

8
Calculation of VIL, and VIH
By definition, VIL is the smaller of the two input voltage at which the slope of the
VTC becomes equal to - 1. i.e. dVout /dVin = -1
Vout > Vin - VT0 , saturation region
VDD - Vout k n
= ⋅ (Vin − VT 0 )
2

RL 2
1 dVout 1
− ⋅ = k n ⋅ (Vin − VT 0 ) ⇒ − ⋅ (− 1) = k n ⋅ (Vin − VT 0 )
RL dVin RL
1
VIL = VT 0 +
k n RL
2
k R  1  1
Vout (Vin = VIL ) = VDD − n L ⋅ VT 0 + − VT 0  = VDD −
2  k n RL  2k n RL

VIH is the larger of the two voltage points on the VTC at which the slope is equal to - 1
Vout < Vin - VTO , linear region
VDD -Vout k n
RL 2
[
= ⋅ 2 ⋅ (Vin − VT 0 ) ⋅Vout − Vout
2
]
1 dVout k n  dV 
= ⋅ 2 ⋅ (Vin − VT 0 ) ⋅ out − 2Vout ⋅ out 
dV
− ⋅
RL dVin 2  dVin dVin 


1
RL
[
⋅ (− 1) = k n ⋅ (Vin − VT 0 ) ⋅ (− 1) + 2Vout ]
1
VIH = VT 0 + 2Vout −
k n RL
To determine the unknown variables
VDD - Vout k n   1  
= ⋅ 2 ⋅ VT 0 + 2Vout − − VT 0  ⋅ Vout − Vout
2

RL 2   k n RL  
2 VDD
Vout (Vin = VIH ) = ⋅
3 k n RL
9
8 VDD 1
VIH = VT 0 + ⋅ −
3 k n RL k n RL
VTC for different knRL
• The term knRL plays an important role in determining the shape of
the voltage transfer characteristic
• knRL appears as a critical parameter in expressions for VOL, VIL, and
VIH
• knRL can be adjusted by circuit designer
• VOH is determine primarily by the power supply voltage, VDD
• The adjustment of VOL receives primarily attention than VIL, VIH
• Larger knRL ⇒VOL becomes smaller, larger transition slope

10
Example 5.1

11
Power consumption

• The average power consumption


– When input low, VOL
• The driver cut-off, no steady-state current flow, DC
power consumption is zero
– When input high, VOH
• Both driver MOSFET and the load resistor conduct
a nonzero current
• The output voltage VOL, so the current ID=IR=(VDD-
VOL)/RL
– P VDD VDD − VOL
DC ( average ) = ⋅
2 RL

12
Chip area
• The chip area depend on two
parameters
– The W/L ratio of the driver
transistor
• Gate area WxL
– The value of the resistor RL
• Diffused resistor
– Sheet resistance 20 to 100Ω/□
– Very large length-to-width rations
to achieve resistor values on the
order if tens to hundreds of kΩ
• Ploysilicon resistor
– Doped polysilicon (for gate of the
transistor), Rs~20 to 40 Ω/□
– Undoped polysilicon, Rs Rs~10M
Ω/□
– The resistance value can not be
controlled very accurately B large
variation of the VTC
– Low power static random access
memory (SRAM)

13
Example 5.2

14
Inverters with n-type MOSFET load
• The resistive-load inverter
– The large area occupied by the load resistor
• The main advantage of using a MOSFET as
the load device
– Smaller silicon area occupied by the transistor
– Better overall performance
• Enhancement-load nMOS inverter
– The saturated enhancement-load inverter
• A single voltage supply
• A relative simple fabrication process
• VOH=VDD-VT,load
– The linear enhancement-type load
• VOH=VDD
• Higher noise margins
• Two separate power supply voltage (drawback)
– Both type suffer from relatively high stand-by
(DC) power dissipation
• Not used in any large-scale digital applications

15
Depletion-load nMOS inverter
• Slightly more complicated
– Channel implant to adjust the
threshold voltage
• Advantages
– Sharp VTC transition better
noise margins
– Single power supply
– Smaller overall layout area
– Reduce standby (leakage)
current
• The circuit diagram
– Consisting
• A nonlinear load resistor,
depletion MOSFET, VT0,load<0
• A nonideal switch (driver) ,
VT ,load = VT 0,load + r ( 2φ F + Vout − 2φ F )
enhancement MOSFET, When the output voltage is small, Vout < VDD + VT,load
VT0,load>0 The load transistor is in saturation region
– The load transistor I D ,load =
2
k n ,load
[ 2
]
⋅ − VT ,load (Vout ) =
2 k n ,load
⋅ VT ,load (Vout )
2

• VGS=0, always on
For larger output voltage level, Vout > VDD + VT,load
– The load transistor operates in the linear region

I D ,load =
k n ,load
2
[
⋅ 2 VT ,load (Vout ) ⋅ (VDD − Vout ) − (VDD − Vout )
2
]
16
Calculation of VOH, VOL, VIL, ViH

When Vin is smaller than VT 0 ⇒ driver → off, load → linear region


zero drain current, VOH = VDD

I D ,load =
2
k n ,load
[
⋅ 2 VT ,load (VOH ) ⋅ (VDD − VOH ) − (VDD − VOH ) = 0
2
]
To calculate the output low VOL
assume, Vin = VOH = VDD ⇒ driver → linear region, load → saturation region
k driver
2
[
⋅ 2 ⋅ (VOH − VT 0 ) ⋅ VOL − VOL
2 k
2
] [
= load ⋅ − VT ,load (VOL )
2
]
 
(VOH − VT 0 )2 −  kload  ⋅ VT ,load (VOL )
2
VOL = VOH − VT 0 −
 k driver 

17
Calculation of VOH, VOL, VIL, VIH
Calculation of VIL
The driver ⇒ saturation region, the load ⇒ linear region
k driver
2
2 k
2
[
⋅ (Vin − VT 0 ) = load ⋅ 2 VT ,load (Vout ) ⋅ (VDD − Vout ) − (VDD − Vout )
2
]
Differential both sides with respect to Vin
  dVT ,load   dV 
2 VT ,load (Vout )  −  + 2(VDD − Vout ) − T ,load 
 dVout   dVout 
k driver ⋅ (Vin − VT 0 ) = load ⋅ 
k
2  dV  
− 2(VDD − Vout ) − T ,load  
   
 dVout 
sbustitute dVout /dVin = -1
k
VIL = VT 0 +  load

[
 ⋅ Vout − VDD + VT ,load (Vout ) ]
 k driver 
Calculation of VIH
The driver ⇒ linear region, the load ⇒ saturation region
k driver
2
[
⋅ 2 ⋅ (Vin − VT 0 ) ⋅Vout − Vout
2 k
2
]
= load ⋅ [− VT ,load (Vout )]
2

Differential both sides with respect to Vin


  dV   dV   dV   dVout 
k driver ⋅ Vout + (Vin + VT 0 ) out  − Vout  out  = kload ⋅ [− VT ,load (Vout )]⋅  T ,load  ⋅  
  dVin   dVin   dVout   dVin 
sbustitute dVout /dVin = -1
k   dV 
VIH = VT 0 + 2Vout +  load  ⋅ [− VT ,load (Vout )]⋅  T ,load 
 k driver   dVout 
dVT ,load γ
= 18
dVout 2 2φF + Vout
VTC of depletion load inverters
• The general shape of the
inverter VTC, and ultimately,
the noise margins, are
determined by
– The threshold voltage of the
driver and the load
• Set by the fabrication process
– The driver-to-load ratio
kR=(kdriver/kload)
• Determined by the (W/L)
ratios of the driver and the
load transistor
• One important observation
– A sharp VTC transition and
larger noise margins can be
obtained with relative small
driver-to-load ratios
• Much small area occupation

19
Design of depletion-load inverters
• The designable parameters in the inverter circuit are
– The power supply voltage VDD
• Being determined by other external constrains
• Determining the output level high VOH=VDD
– The threshold voltages of the driver and the load
• Being determined by the fabrication process
– The (W/L) ratios of the driver and the load transistor
• W  W 
k n′ ,driver ⋅    
VT ,load (VOL )
2
k driver L  driver  L  driver
kR = = , kR = , kR =
kload 2(VOH − VT 0 )VOL − VOL
2
W  W 
k n′ ,load ⋅    
L load  L load

• Since the channel doping densities are not equal


– The channel electron mobilities are not equal
– K’n,load≠k’n,driver
• The actual sizes of the driver and the load transistor are
usually determined by other constrains
– The current-drive capability
– The steady state power dissipation
– The transient switching speed
20
Power consideration
• The steady-state DC power consumption
– Input voltage low
• The driver off, Vout=VOH=VDD
• No DC power dissipation
– Input voltage high, Vin≈VDD and Vout=VOL

I DC (Vin = VDD ) = load ⋅ [− VT ,load (VOL )]


• K 2

2
= [
K driver
2
]
⋅ 2 ⋅ (VOH − VT 0 ) ⋅ VOL − VOL
2

Assume the input voltage level low 50% operation


time and high during the other 50%

PDC = DD ⋅ load ⋅ [− VT ,load (VOL )]


V k 2

2 2

21
Area consideration
• Figure (a)
– Sharing a common n+
diffusion region
• Saving silicon area
– Depletion mode
• Threshold voltage adjusted by
a donor implant into the
channel
– (W/L)driver>(W/L)load, ratio
about 4
• Figure (b)
– Buried contact
• Reducing area
• For connecting the gate and
the source of the load
transistor
– The polysilicon gate of the
depletion mode transistor
makes a direct ohmic with
the n+ source diffusion
– The contact window on the
intermediate diffusion area
can be omitted

22
Example 5.3 (1)

23
Example 5.3 (2)

24
Example 5.3 (3)

25
CMOS inverter
• Complementary push-pull
– High input BnMOS driver, pMOS load
– Low input BpMOS driver, nMOS load
• Two important advantages
– Virtually negligible steady state power dissipation
– VTC exhibits a full output voltage swing between 0V and VDD, transition is very
sharp
• Latch up problem
– Formation of two parasitic bipolar transistors
– Preventing
• Guard rings

26
Circuit operation
• Region A: Vin<VT0,n
– nMOS off, pMOS on B ID,n=ID,p=0,
Vout=VOH=VDD
• Region B: Vin>VT0,n
– nMOS saturation, the output
voltagedecreases
– The critical voltage VIL, (dVout/dVin)=-1
is located within this region
– As the output further decreases
BpMOS enter saturation, boundary
of region C
• Region C:
– If nMOS saturation B VDS,n≥VGS,n-
VT0,n ⇔ Vout ≥Vin-VT0,n
– If pMOS saturation B VDS,n≤VGS,p-
VT0,p ⇔ Vout ≤Vin-VT0,p
– Both of these conditions for device
saturation are illustrated graphically as
shaded areas
• Region D: Vout<Vin-VT0,p
– The criical point VIH
• Region E: Vin>VDD+VT0,p
– Vout=VOL=0
27
Circuit operation
• The nMOS and the pMOS transistors an be
seen as nearly ideal switches
– The current drawn from the power supply in both
these steady state points region A and region E
• Nearly equal to zero
• The only current Breverse biased S, D leakage current
– The CMOS inverter can drive any load
• Interconnect capacitance
• Fan-out logic gates
• Either by supplying current to the load, or by sinking current
from the load

28
The steady-state input-out voltage characteristics

29
Calculation of VIL, VIH
nMOS saturation, pMOS linear
kn
2
2

2
[
⋅ (VGS ,n − VT 0,n ) = p ⋅ 2 ⋅ (VGS , p − VT 0, p )⋅ VDS , P − VDS
k 2
,p]
kn
2
2

2
[
⋅ (Vin − VT 0,n ) = p ⋅ 2 ⋅ (Vin − VDD − VT 0, p )⋅ (Vout − VDD ) − (Vout − VDD )
k 2
]
  dV   dV 
k n ⋅ (Vin − VT 0,n ) = k p ⋅ (Vin − VDD − VT 0, p )⋅  out  + (Vout − VDD ) − (Vout − VDD ) ⋅  out 
  dVin   dVin 
substituting Vin = VIL and (dVout /dVin ) = -1
k n ⋅ (VIL − VT 0.n ) = k p ⋅ (2Vout − VIL + VT 0, p − VDD )
2Vout + VT 0, p − VDD + k RVT 0,n kn
VIL = where k R =
1 + kR kp

nMOS linear, pMOS saturation


kn
2
[
⋅ 2 ⋅ (VGS ,n − VT 0,n )⋅ VDS ,n − VDS
2
]
,n =
kp
2
⋅ (VGS , p − VT 0, p )
2

kn
2
[
⋅ 2 ⋅ (Vin − VT 0,n )⋅Vout − Vout2
] = p ⋅ (Vin − VDD − VT 0, p )
k
2
2

  dV   dV 
k n ⋅ (Vin − VT 0,n )⋅  out  + Vout − Vout ⋅  out  = k p ⋅ (Vin − VDD − VT 0, p )
  dVin   dVin 
substiting Vin = VIH and (dVout /dVin ) = -1
k n ⋅ (− VIH + VT 0,n + 2Vout ) = k p ⋅ (VIH − VDD − VT 0, p )
VDD + VT 0, p + k R ⋅ (2Vout + VT 0,n ) 30
VIH =
1 + kR
Calculation of Vth
The inveter th reshold voltage is defined as Vth = Vin = Vout
Since the CMOS inverter exhibits large noise margins and very sharp VTC transitio n
the inverter t hreshold voltage emerges as an imporant parameter characteri zing the DC
performanc e of the inverter
For Vin = Vout , both trans istor are in saturation mode

⋅ (VGS , n − VT 0 , n ) = ⋅ (VGS , p − VT 0 , p )
kn 2 kp 2

2 2

⋅ (Vin − VT 0 , n ) = ⋅ (Vin − V DD − VT 0 , p )
kn 2 kp 2

2 2
 kp 
⋅ (V DD + VT 0 , p )
kp
Vin ⋅  1 +  =V +
 k  T 0,n
k
 n  n

⋅ (V DD + VT 0 , p )
1
VT 0 , n +
kR
Vth =
 1 
 1 + 
 k R 

If Vin = Vth , the output vol tage can actually attain any
value between (Vth -VT 0 ,n ) and (Vth -VT 0 ,p )
31
Threshold voltage
• The Region C of VTC
– Completely vertical
• If the channel length modulation effect is neglected, i.e. if λ=0
– Exhibits a finite slope
• If λ>0
• Fig 5.22 shows the variation of the inversion (switching) threshold
voltage Vth as function of the transconductance ratio kR

32
VTC and power supply current
• If input voltage is either
smaller than VT0,n, or
larger than VDD+VT0,p
– Does not draw any
significant current from the
power supply
– Except for small leakage
current and subthreshold
currents
• During low-to-high and
high-to-low transitions
– Regions B, C, and D
– The current being drawn
from the power source
– Reaching its peak value
when Vin=Vth (both
saturation mode)

33
Design of CMOS inverters
2
1 Vth − VT 0, n k  VDD + VT 0, p + Vth 
= ⇒ k R = n =  

k R VDD + VT 0, p − Vth k p  Vth − VT 0,n 
1
The switching threshold voltage of an ideal inverter is defined as Vth ,ideal = ⋅VDD s
2
2
k   0.5VDD + VT 0, p 
substituting 5.74 in 5.73 ⇒  n  =  

k  0.5V + V
 p  ideal  DD T 0, n 

k 
we can achieve complely symmetric input - output characteristics by setting VT 0 = VT 0 ,n = VT 0 ,p ⇒  n  =1
 k  symmertric
 p
inverter

W  W 
µ n C OX ⋅  µn ⋅  
kn L n L n
= =
kp W  W 
µ p C OX ⋅  µp ⋅ 
L p L p
assume tox , Cox have the same value for nMOS and pMOS
W 
 
 L  n µ p 230cm / V ⋅ s  W 
2
W 
= ≈ ⇒   ≈ 2.5 
W  µ n 580cm 2 / V ⋅ s  L  p  L n
 
 L p
For a symmetric CMOS inverter with VT 0 ,n = VT 0 ,p and k R = 1

VIL = ⋅ (3VDD + 2VT 0,n ),VIH = ⋅ (5VDD − 2VT 0,n )


1 1
8 8
VIL + VIH = VDD , NM L = VIL − VOL = VIL , NM H = VOH − VIH = VDD − VIH
NM L = N MH = VIL 34
Example 5.4

35
Supply voltage scaling in CMOS inverters

• The static characteristics of the CMOS


inverter allow significant variation of supply
voltage without affecting the functionality of
the basic inverter
• The CMOS inverter will continue to operate
correctly with a supply voltage limit value
– min
VDD = VT 0,n + VT 0, p
– Correct inverter operation will be sustained if
at least one of the transistors remains in
conduction, for any given voltage
– The exact shape of the VTC near e limit
value is essentially determined by
subthreshold conduction properties
• If the power supply voltage is reduced
below the sum of the two threshold
– The VTC will contain a region in which none
of the transistors is conducting
– The output voltage level is determine by the
previous state of the output
– The VTC exhibits a hysteresis behavior

36
Power and area consideration
• Power consideration
– DC power dissipation of the circuit is almost negligible
– The drain current
• Source and drain pn junction reverse leakage current
• In short channel leakage current
• Subthreshold current
– However, that the CMOS inverter does conduct a significant amount of current
during a switching event
• Area consideration

37

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