C113-E031A

ICP Mass Spectrometer

ICPMS-2040 Series
ICPMS-2050 Series
An Era Without Compromise

Exceptional yet Eco Friendly

Proprietary Advanced Mini-Torch System

Redesigned Collision/Reaction Cell

High-Performance Quadrupole Mass Filter

High Throughput with No Additional Cost

"High-Speed Cell Gas Purging" Reduces Measurement Times

"ProActive Rinsing" Efficiently Rinses the Sample Introduction System

Minimal Operation Required

"Extended Rinsing" Automatically Minimizes Carryover

"Dual Valve Unit" Enables Autonomous Operation after Plasma Ignition

"Preset Methods" Eliminate the Need for Method Development

 Exceptional yet Eco Friendly

An advanced mini-torch design, combined with a redesigned collision/reaction cell, and a high-perfor-
mance quadrupole mass filter result in an environmentally friendly system with superior analytical
performance.

Quadrupole Mass Filter Collision/Reaction Cell Mini-Torch System

Pro pr i et ar y A d van c ed M ini-Torch S y ste m

~2 times higher
R ed ev e lo p e d H ig h S e n sit iv it y sensitivity
M i n i - To rch New design

Optimizing the torch design keeps argon gas Wide

consumption low and decreases sample flow
rate into the plasma, improving sample
Plasma temperature = 7500 K
ionization efficiency. The new design roughly Injector bore diameter
doubles sensitivity compared to previous Previous design
models while reducing injector clogging
issues. Narrow

0 10 20
L o w A r g o n G a s C o n s u m p t io n

Typical ICP-MS system

A major drawback of ICP-MS systems is the large argon
(18 L/min flowrate)
gas consumption. Shimadzu’s mini-torch system
consumes 11 L/min of argon, two-thirds the amount ICPMS-2040/2050 Series
(Mini Torch)
used by typical plasma torches. Continuous operation
using a 7 m 3 gas cylinder is up to 10 hours. Utilizing ICPMS-2040/2050 Series
(Eco Mode)
Eco mode (Plasma gas: 5.5 L/min) during standby can
further reduce argon gas consumption.
Total Gas Flowrate (L/min)

Reduction in gas
consumption
No Ne e d f o r H ig h -P u r it y A r g o n G as Use of low-purity gas

ICPMS-2040/2050 Series systems have a Shimadzu-made

high-frequency power supply that features high-speed
Typical ICP-MS system ICPMS-2040/2050 Series
matching functionality, allowing for the use of low-cost, (99.999 % purity at (99.99 % purity at
18 L/min flowrate) 11 L/min flowrate)
low-purity (99.95 %) argon gas to reliably generate a
robust plasma. Argon Gas Cost Reduction

Note: The reduction in cost will vary according to

current gas pricing. This calculation assumes the
price of 99.999% purity argon is two times higher
than the price of 99.99% purity.

4
R ed es i g n e d C o l l i s i o n / R eac t i o n Ce ll Product

C o l l i s i o n M od e

Inert helium gas is introduced into the cell to selectively attenuate kinetic energies of polyatomic ions
based on their sizes. These low energy ions are removed from the ion beam by applying a bias voltage at
the cell exit. Because fewer by-product ions are generated, it can be used for a wide range of applications.

O n l i n e I n tere le m e n t C o r re ct io n (IE C )

Shimadzu’s proprietary online interelement correction (IEC) function is used to correct for spectral
interference that cannot be eliminated by the collision mode. By only measuring one standard sample
an interference correction is calculated and applied to all samples run subsequently.

R eac ti o n M o d e

When a specific gas is introduced into the cell, the reaction of gas with ions is used to reduce
interferences. Target ions can be analyzed with high sensitivity, while both doubly charged ions not
eliminated by the collision mode and polyatomic ions can be reduced.

Interface
Quadrupole Mass Filter Collision/Reaction Cell
Region
Target ion 78 Se +

Doubly charged ion 156 Gd 2+

m/z=78 Polyatomic ion 40 Ar 38Ar+

m/z=156

Reaction gas H2

Note: Example of how reaction mode can be used. Reaction gas H 2 is used in this example to convert doubly-charged ions to singly-charged ions,
and charged polyatomic ions to neutral clusters.

H i g h - Per f o r man c e Qu ad r u p o l e Ma ss Filte r

C h arg e Stabiliz e r

To mitigate ion charge effects on the mass filter, a pulse voltage is applied between the analysis of
each mass to maintain a constant charge level at the electrode surface. This improves the signal
stability when analyzing samples for long periods (patent pending).

Hi g h - R es o l ut io n Mo d e a n d H a lf -Ma s s Cor rec t ion

Masses can be analyzed at 0.5 u intervals using high-resolution mode, enabling half-mass correction for
doubly charged interferences common in rare earth elements (REEs).

5
 High Throughput with No Additional Cost

The improved gas controller features high-speed cell gas purging. Combined with ProActive Rinsing,
measurement times can be significantly shortened without any additional accessories or cost.

Time reduction due to gas purging

23 sec × 100 = 2300 sec
Previous
Measure a series of Time reduction due to ProActive Rinsing
model
40 sec × 99 = 3960 sec
100 samples (example)
5 hr and 40 min About 1 hr and 44 min Time Reduction ICPMS-2040/2050 Series
4 hr

H i g h- Sp eed C el l G as Pu r ging
Measurement Time per Sample

Previous model Measure Rinse

The redesigned gas controller shortens cell
gas introduction and exhaust times (patent
pending).
ICPMS-2040/2050 Series Measure Rinse 23
sec

shorter

P ro Ac t i ve R i n s i n g Product

While measuring multiple samples, the rinsing sequence can be started early by sending the autosam-
pler probe to rinse while collecting data using sample already in the suction line. This greatly
reduces measurement time and conserves sample.

Without
ProActive Introduce Introduce Introduce
sample Measure Rinse sample Measure Rinse sample
Rinsing

With
ProActive Introduce
sample Measure
Rinsing
Introduce 40 sec
Rinse sample Measure shorter

Introduce
Rinse sample Measure

Note: The reduction in time depends on the measurement conditions. In the example above, the Preset method for Drinking Water in
ICPMS-2040 was used.

6
Minimal Operation Required

Using the extended rinsing function with an optional dual valve unit allows the Product
ICPMS-2040/2050 Series systems to run autonomously after plasma ignition.

E xt en d ed R i n s i n g
— Au to mati ca lly M in im iz e s C a r r y o v e r —

Remeasurement required due to

Normal Sequence Carryover carryover

Sample 1 Rinse Sample 2 Rinse Sample 3 Rinse Sample 3’

High
concentration Automatically performs additional
of target
Executed rinsing after measuring samples with a
With Extended Rinsing ON elements
automatically high concentration of target elements.

Sample 1 Rinse Sample 2 Rinse Additional Sample 3

rinse

Analyzing samples containing a high concentration of target elements can cause carryover to the
next sample, preventing accurate measurements. The extended rinsing function automatically
performs an additional rinse sequence when a target element exceeds a predetermined upper limit.
A second rinse solution can be used in the additional rinsing sequence to improve rinsing effectiveness.
Consequently, carryover is eliminated to ensure high-quality data.

D u a l Va l ve U n i t
— En ab l es Aut o n o m o u s Op e r a t io n a f t er Plas m a Ignit ion—

Normal
Ignite plasma Tune instrument Start measurement Rinse instrument Extinguish plasma

Operator moves the probe

Dual valve unit used

Automatic

Ignite plasma Operator does not need to move the probe

When using an Online Internal Standard Kit

Autosampler
(optional), the operator must move the probe
before and after data acquisition. The optional
Dual Valve Unit allows seamless switching Valve A
1
between tuning solution and rinsing solution
while also automatically adding internal Cleaning solution Pure water
Valve B
standard solution to samples. The entire 3
sequence, from instrument tuning, to measure-
ment, to rinsing, and plasma off, are performed
Internal standard Dual valve unit Tuning solution
automatically. solution

7
 Engineered for Simplicity

Eas y - t o - M ai n t ai n Samp l e Introduction S y ste m

Easy-to-Access Plasma Stand

Easy-to-Remove
The large opening plasma stand allows effortless
access to the plasma torch and interface. Interface

The interface can be quickly removed

without tools by simply loosening the
fastening screw.

Aerosol Dilution
System

By introducing argon gas between the

chamber and the torch, samples with high
TDS (total dissolved solids), such as seawater,
are diluted and introduced directly into the
plasma.

Peltier Cooled
Cyclone Chamber

The system utilizes a high-ef-

ficiency coaxial nebulizer
and electronically-cooled
cyclone chamber for mini-
mizing memory effects and
increasing sample throughput.

Gravity Drain

A unique gravity drain design ensures proper

draining, eliminating the need for pump
tubing and concerns about plasma interruption
due to flooding.

8
A S- 2 0 A u t o s amp l er

R o tary Des i gn R e d u c e s Tu b in g L e n g t h
The autosampler has 60 15-mL and 8 50-mL vial
positions. The rotary design allows for shorter
sample introduction times and can reduce
memory effects.

Rotary Type XY-Table Type

(Minimizes probe tube length) (A longer tube length is
required to reach the furthest vial)

Dual Rinse Port with Overflow Function

The overflow-type rinse system includes both a standard and
auxiliary port to reduce contamination between samples. An
optional rinse station* can be added for organic solvents.
* The organic solvent rinse station does not include overflow functionality.

Rinse port

S i mp l e an d D es c r i p t i ve
M a i n t en an c e Wi n d o w

The maintenance information/setting window in new

LabSolutions ™ ICPMS software clearly indicates opera-
tion times of key components and automatically alerts
users when it is time to maintain and/or replace parts,
taking the guesswork out of maintenance.

Pre s e t M et h o d s Applications

Preset analytical methods come configured with optimized settings, such as plasma conditions, target
elements, mass information, and internal standards, for common ICPMS applications. The
ICPMS-2040/2050 Series systems can therefore be used immediately after installation with minimal
training.

E n viro n me n tal A method for analyzing drinking/tap water and a method for analyzing high matrix samples, such as waste
te stin g water, are included.

A method for analyzing food samples with low TDS and a method for food samples with high TDS are included.
Fo o d s

Methods are included, respectively for ICH Q3D analysis of oral, parenteral, inhalation and cutaneous drugs.
P h arma ceu tica ls

9
 Software

N ew L ab So l u t i o n s ™ I C PM S S oftw a re

The new version of LabSolutions ICPMS software displays all necessary information in a single
window, simplifying operation for new users. Experienced users can utilize advanced configurable
settings for challenging applications, in-depth research and all analyses in between.

A nalys is Window

The customizable analysis window can simultaneously

display the current sample profile, registered
samples, analytical results, errors, and instrument
status. The analysis progress can be monitored at a
glance. Windows can be configured and customized
based on the user's preference. The assistant bar
along the left side guides the users through every
step of analysis in the correct order.

Ins t r um ent St at us Window

The instrument status window displays information

about the instrument and accessories in a compre-
hensive and easy-to-understand layout.
A warning indicator is displayed if an error occurs or
if a part is due for maintenance or replacement.

A ut om at ic Int er nal St andard M onit or ing

Internal standard fluctuation can be displayed as a

graph for the entire analysis time, as either intensity
or intensity ratio with respect to a reference sample.
This helps quickly identify complications that occur
due to sample matrix effects.

LabSolut ions ™ ICPM S TRM (Opt ional)

Shimadzu LC-ICP-MS systems combined with LabSolu-

tions ICPMS TRM software can be used to speciate
arsenic, mercury, and other elements. The software
controls and configures both LC and ICPMS systems
in one simple platform.

10
L a b So l u t i o n s ™ C S Su p p o r t s L abora tory Ne tw ork ing

Server room / Data center / Cloud*4 Office Branch offices / Working remotely

LabSolutions server Terminal server*2 Client PC Terminal client PC*3

Analytical laboratory

Acquisition
controller PC*1

EDX ICPE TOC-V AA

LC GC Agilent LC, GC Thermo LC, GC Combine with
Multi-Data Registration License
to enable integrated management
of these instruments’ data and user
information.

LCMS GCMS FTIR UV RF TA

PC

A instrument B instrument

Combine with
Multi-Data Registration License
Balance PPSQ™ ICPMS Particle Size AG TOC-L
Analyzer to enable integrated management

*1 The acquisition controller PC controls analytical instruments.

*2 A terminal server is a server for using terminal services. Users can view data reports and perform electronic signature operations through terminal services. It is ideal
for remote connections because of the low network load. Only LC, GC, LCMS, and GCMS support analysis and postrun operations through terminal services.
*3 If a terminal service is used, LabSolutions software does not need to be installed on client PCs or tablets.
*4 Servers can be built on various clouds (IaaS). AWS (Amazon Web Services), Microsoft® Azure®, GCP™ (Google Cloud Platform™ )

Adding a LabSolutions ™ DB/CS connection kit (optional) enables compliance with electronic record-
keeping and electronic signature regulations, such as requirements specified in FDA 21 CFR Part 11.
Select either a standalone (LabSolutions DB) or networked (LabSolutions CS) system that is best for
the given application. LabSolutions CS manages all analytical data in a database on a network server,
so that the data can be loaded and postrun analysis can be performed on any computer connected to
the network.
Note: An additional software license is required for loading data onto a computer not connected to
an ICPMS-2040/2050 Series system.

So ftware R e q u ire d f o r C o n n e ct in g t o LabSolut ions

Name P/N Remarks

LabSolutions DB Connection Kit for ICPMS 211-49204-92 Standalone system

LabSolutions CS Connection Kit for ICPMS 211-49241-92 Network system

Second License for LabSolutions ICPMS Required for installing LabSolutions ICPMS on a
211-49245-91 computer other than the control computer

11
 Peripheral Equipment

AS -20 Aut os am pl er ( P/ N 211- 9740 0 - 5 8 )

The rotary-type autosampler has 60 15-mL and 8 50-mL vial positions.

Dimensions W290 × D508 × H300 mm (excluding arm) Note: Requires a separate power cord.
Note: An additional rinsing port is optional
Power supply Single-phase 100-240 V, 50/60 Hz, 50 VA
Rinse Port Additional Kit for AS-20 (P/N 211-97460-41).
Weight 11 kg (main unit)

AS X-560 Aut os am pl er A S X - 2 8 0 A u to sa mp l e r
(P / N 211- 94230- 01) ( P /N 2 1 1 - 9 4 4 1 2 )

ASX-560 holds 240 14-mL vials and ASX-280 holds 120 14-mL vials and
10 50-mL vials for standards. By 10 50-mL vials for standards. By
replacing the standard rack with a replacing the standard rack with a
rack sold separately, 160 20-mL vials rack sold separately, 80 20-mL
or 84 50-mL vials can be held. vials or 42 50-mL vials can be held.

Dimensions W580 × D550 × H620 mm (including sample probe) Dimensions W360 × D550 × H660 mm (including sample probe)
Power supply 100–240 V AC, 50/60 Hz, 200 VA Power supply 100-240V AC, 50/60Hz, 200 VA
Weight 12 kg (main unit) Weight 8.1 kg (main unit)

Note: Requires a separate ASX connection kit for ICPMS (P/N Note: Requires a separate ASX connection kit for ICPMS (P/N
211-94476-41). 211-94476-41).

Online I nt er nal St andard Ki t D u a l Va l v e U n i t ( P /N 2 1 1 - 9 7 4 7 2 - 4 1 )

(P / N 211- 95010- 41) This is used to automatically switch between multiple
solutions, such as pure water, instrument tuning
This kit is used for in-line
solution, internal standard solution and cleaning solution.
mixing of sample and
internal standard solution Dimensions W95 × D170 × H145 mm
and introducing the mixture Power supply 100-240 V AC, 200 VA
into the nebulizer. Weight 1.8 kg (main unit)

Note: Requires a separate AC adapter and power cord.

HFS-6 Hydrof l uor i c Ac i d Sam pl e

Injecti on Sys t em ( P/ N 211- 93828- 4 2 ) O rg a n i c S o l v e n t I n j e cti o n S y ste m
This system is used to directly introduce samples that
( P /N 2 1 1 - 9 7 0 1 9 - 4 1 )
contain hydrofluoric acid. Fluoropolymer materials are For analysis of organic solvents, a gas mixture of 70%
used in the nebulizer, chamber, and drain system, whereas argon and 30% oxygen is introduced into the torch to
alumina is used in the injector unit on the torch. prevent precipitation of carbon (C) from organic solvents.
This system includes a gas controller for mixed gases, a
quadruple torch for organic solvents, and pump tubing
Cyclo ne Cham ber, Q uar t z for organic solvents (for ethanol/methanol/IPA).
(P / N 211- 95849)

This chamber is used to analyze trace boron, which is

S ta n d a rd To rch K i t ( P /N 2 1 1 - 9 7 2 2 2 - 4 1 )
challenging to analyze using a standard borosilicate glass
chamber. This kit includes a torch with a 1.8 mm injector bore
diameter that supports a 1.6 kW high-frequency output as
well as a compatible shield screen, bonnet, and adapter.
3 rd G as I nt roduc t i on Uni t
(P / N 211- 96095- 41)
Wa te r B u b b l e r ( P /N 2 0 4 - 1 9 2 8 1 )
This gas controller unit is for using a 10 % ammonia and
90 % helium gas mixture as the reaction gas in an This is used to humidify argon gas and prevent clogging
ICPMS-2050 system. of the torch and nebulizer when analyzing high TDS
samples.

LC Connec t i on Ki t ( P/ N 211- 96650 - 4 1 )

L a b S o l u ti o n s I C P MS T R M
This connection kit is required for configuring an ( P /N 2 1 1 - 4 9 2 0 0 - 9 2 )
LC-ICP-MS system that combines an ICPMS-2040/2050
Series system with a Nexera inert series or Prominence This software is for controlling Shimadzu LC and
inert analysis system. For information about compatible ICPMS-2040/2050 Series systems and analyzing chromatog-
LC systems, contact Shimadzu. raphy data.

12
Va c u u m Pu mp

A rotary or dry pump is required for backing the turbomolecular pump and evacuating the interface
unit. Power is supplied to the pump from the ICPMS main unit.

Rot a r y P um p , PF PE ( P/ N 211- 90070- 42) D ry P u mp ( P /N 2 1 1 - 9 6 3 8 2 - 9 1 )

This pump is lubricated with a PFPE oil that allows the This oil-free dry pump has low maintenance requirements.
pump to be used for applications ranging from regular
analysis to LC-ICP-MS analysis.

Dimensions W496 × D295 × H325 mm Dimensions W494 × D217 × H301 mm

Weight Approx. 50 kg Weight Approx. 30 kg

Name P/N Remarks

Caster 225-27850-05 Rotary pump stand with caster wheels
Requires a separate rotary pump noise reduction box kit (P/N
Noise Absorbing Box, Large 225-27850-07
211-93825-41).
Vacuum Hose Elbow Connection 211-96090-41 Required for placing the pump under the support stand
Long Vacuum Hose, 4 m 211-97232-42 For extending the rotary pump exhaust hose
RP Power Cable, 3 m 211-95576-41 For extending the exhaust hose

C o o l i n g Wat er C i rc u l at o r Used to cool the main unit. Select one of the following.

S t anda rd Mo del N o n - F re o n Mo d e l
Cooling Water Ci rc ul at or, SM C C o o l i n g Wa te r C i rcu l a to r,
(P / N 21 1-9 72 73- 41) A p i ste ( P /N 2 1 1 - 9 7 2 7 4 - 4 1 )

Dimensions W377 × D500 × H615 mm Dimensions W400 × D600 × H697 mm

Single-phase 200 to 230 V, Three-phase 200 V 50/60 Hz,
Power supply Power supply
50/60 Hz, 1.2 kVA 1.2 kVA
Weight 43 kg Weight 58 kg

Note: Requires a separate chiller connection kit, SMC (P/N Note: Requires a separate chiller connection kit, Apiste (P/N
211-93827-43). 211-93827-42).

13
 Accessories

Sample Introduction System

Standard Set For Organic Solvents For Hydrofluoric Acid Resistance

Environmental water, effluent

water, solutions with dissolved
Examples of Solution containing
pharmaceutical or food Organic solvents
Samples hydrofluoric acid
substances, or other acid
decomposition solutions

Organic Solvent
Mini Torch, 1.5 Mini Torch, HF
Torch
(P/N 211-96077) (P/N 211-95846)
(P/N 211-94021-41)

Shield Screen,
Shield Screen, Mini Shield Screen, Mini
Standard
(P/N 211-93819) (P/N 211-93819)
(P/N 211-93820)
Torch
Bonnet, Mini Bonnet, Standard Bonnet, Mini
(P/N 211-95998) (P/N 211-94047) (P/N 211-95998)

Torch Adapter,
Torch Adapter, Mini Torch Adapter, Mini
Standard
(P/N 211-93779-42) (P/N 211-93779-42)
(P/N 211-93780-42)

Extension Pipe Extension Pipe, HF

(P/N 211-95574) (P/N 211-95847)
Extension Pipe
Dilution Gas Tube
(P/N 211-95989)

Cyclone Chamber Cyclone Chamber, HF

(P/N 211-96078) (P/N 211-95848)
Chamber
Helix CT Locking Screw with Seal
(P/N 046-00093-95)

Nebulizer, DC04 Nebulizer, HF

(P/N 211-95988) (P/N 211-95845)
Nebulizer
Carrier Gas Tube Suction Tube, NFT-050
(P/N 046-00092-53) (P/N 211-97567-41)

Drain Drain Trap Drain Trap, HF

(P/N 211-93814-01) (P/N 046-00093-06)

Pump Tube, 0.76-BLK3B-95-SF-F

(P/N 018-31558-61) *1
Peristaltic Pump Tube, 0.76-BLK3B-95-F Pump Tube, 0.64-OW-MH-95-F Pump Tube, 0.76-BLK3B-95-F
Pump Tube (P/N 018-31558-44) (P/N 018-31558-32) *2 (P/N 018-31558-44)
Pump Tube, PUR-T,381-2232F
(P/N 016-46043-01) *3

*1: For ethanol/methanol/IPA *2: For DMF/NMP *3: For xylene/kerosene

I n t er f ac e
Standard Set Option

Nickel Sampling Cone Platinum Sampling Cone

Sampling Cone -
(P/N 211-97283-03) (P/N 211-97283-04)

Nickel Skimmer Cone, Small

(P/N 211-90200-43) Platinum Skimmer Cone Copper Skimmer Cone
Skimmer Cone
Used in combination with spacer (P/N 211-90194-02) (P/N 211-90200-41)
for small skimmer (P/N 211-95342-01).

14
Installation

I n s t al l at i o n I n f o r mat i o n

Temperature within 18 to 28 °C (max. 2 °C/hour change)

1. Installation
Humidity within 20 to 70 %RH (with no condensation)
Site Environment

Avoid using the system in locations with significant vibration or dust.

Main unit Single-phase 200 to 240 V ± 10 %, 50/60 Hz,6 kVA

Data processing Single-phase 100 V ± 10 %, 50/60 Hz, 110 VA
2. Power Supply
Cooling water Single-phase 200 to 230 V, 50/60 Hz, 1.2 kVA (standard type)
circulator
Three-phase 200 V, 50/60 Hz, 1.2 kVA (non-CFC type)

3. Grounding Should be grounded with a maximum resistance of 100 Ω.

Type Argon gas Min. 99.95 % purity Pressure: 500 ± 10 kPa

Helium gas Min. 99.999 % purity Pressure: 200 ± 20 kPa
Hydrogen gas *1 Min. 99.999 % purity Pressure: 200 ± 20 kPa
4. Gas Supply 3rd gas *2 (gas mixture of 10 % ammonia and 90 % helium)
Min. 99.999 % purity Pressure: 200 ± 20 kPa
Oxygen-argon mixture gas *3 (70 % argon and 30 % oxygen)
Pressure: 450 ± 10 kPa

5. Cooling Water Use a dedicated cooling water circulator.

6. Exhaust Duct Exhaust flowrate of 2.4 to 3.3 m 3 /min at exhaust outlet (install a damper).

W853 × D660 × H554 mm

7. Dimensions
(excluding the plasma stand exhaust duct and other protrusions)

8. Weight 144 kg

Note: Refer to the pre-installation requirements for more details.

*1: ICPMS-2050 Series systems only. Hydrogen gas generators can also be used.
*2: When ICPMS-2050 Series systems are equipped with an optional 3rd gas system
*3: When an optional organic solvent injection system is installed

For more detailed system specifications, refer to the specifications sheet.

Examp l e o f Ext er n al D i men s i ons a nd

I n s t a l l at i o n C o n fi g u r at i o n

unit: mm
497
Min. 500

296

554

300
660

615

295

377 853 320 600

1400

15
 ICPMS-2040 Series / ICPMS-2050 Series
• Automated support functions utilizing digital technologies, such as M2M, IoT, and
Artificial Intelligence (AI), that enable higher productivity and maximum reliability.
• Allows a system to monitor and diagnose itself, handle any issues during data acquisition
without user input, and automatically behave as if it were operated by an expert.
• Supports the acquisition of high quality, reproducible data regardless of an operator's skill
level for both routine and demanding applications.

Analytical Intelligence logo, LabSolutions and PPSQ are trademarks of Shimadzu Corporation or its affiliated companies in Japan and/or other countries.
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For Research Use Only. Not for use in diagnostic procedures.

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© Shimadzu Corporation, 2024 / First Edition: August 2023, 3655-04414-PDFIT, C113-E031A