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"Reduction of boron penetration through thin silicon oxide with a nitrogen ..."

Laurent Jalabert et al. (2001)

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DOI: 10.1016/S0026-2714(01)00052-X

access: closed

type: Journal Article

metadata version: 2025-01-19

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Laurent Jalabert, Pierre Temple-Boyer, Gérard Sarrabayrouse, F. Cristiano, B. Colombeau, F. Voillot, C. Armand:
Reduction of boron penetration through thin silicon oxide with a nitrogen doped silicon layer. Microelectron. Reliab. 41(7): 981-985 (2001)

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