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Assignment2 Sol PDF

This document contains the solutions to an assignment on semiconductor materials and devices. It includes 5 questions: 1) Calculating the drift current density in silicon based on doping concentration and applied electric field. 2) Calculating the conductivity and drift current density in compensated GaAs. 3) Finding the doping density needed to achieve a given resistivity in an n-type semiconductor and calculating the resistance. 4) Calculating the diffusion current density in silicon with a linear change in electron concentration. 5) Deriving an expression for the induced electric field in a non-uniformly doped semiconductor in thermal equilibrium and indicating its direction on an energy band diagram.

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0% found this document useful (0 votes)
322 views4 pages

Assignment2 Sol PDF

This document contains the solutions to an assignment on semiconductor materials and devices. It includes 5 questions: 1) Calculating the drift current density in silicon based on doping concentration and applied electric field. 2) Calculating the conductivity and drift current density in compensated GaAs. 3) Finding the doping density needed to achieve a given resistivity in an n-type semiconductor and calculating the resistance. 4) Calculating the diffusion current density in silicon with a linear change in electron concentration. 5) Deriving an expression for the induced electric field in a non-uniformly doped semiconductor in thermal equilibrium and indicating its direction on an energy band diagram.

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JL
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BRAC University

ECE230&EEE209 (Semiconductor Materials and Devices)


Summer 2011
Date Due: 29.06.11
_____________________________________________________________________________________________________________________

Assignment 2 Solution
 
1. Consider a sample of silicon at T = 300 K doped at an impurity concentration of: Nd= 1015 cm‐3. 
Assume  electron  and  hole  mobilities  are  1350  and  480  cm2/V.s,  respectively.  Calculate  the 
conductivity of the silicon. If an electric field is E = 35 V/cm is applied, calculate the drift current 
density. 
J Drift = q (n0 μ n + p 0 μ p )E  

n0 ≅ N d = 10 cm ; p 0 =
15 -3 ni2
=
(
1.5 × 1010 )2

= 2.25 × 10 5 cm -3
15
    n 10  
−19
( )
J Drift = 1.6 × 10 × 10 × 1350 + 2.25 × 10 × 480 × 35 = 7.56 A/cm
15 5 2

Note: 
1. The unit of the current density (A/cm2) 
Current Density = Charge(q ) • Carrier Density(n) • Mobility(μ ) • Electric Field( E )
1 cm 2 V Coulomb s A  
= Coulomb • 3
• • = 2
= 2
cm V.s cm cm cm
2.  The  drift  current  is  quite  high  even  with  a  small  electric  field  and  moderate  doping 
density. 

3. Since electron concentration n0 is much much larger than hole concentration p0, we 
can write, 

J Drift = q(n0 μ n + p0 μ p )E ≈ qn0 μ n E = 1.6 ×1019 ×1015 ×1350 × 35 = 7.56 A cm 2 !  


which  is  exactly  the  same  as  that  calculated  considering  both  electron  and  hole 
concentrations. For extrinsic semiconductors, Drift current is determined by the majority 
carriers only, contribution of minority carriers is negligible. 
 
2. Consider a compensated GaAs semiconductor at T = 300 K. Nd= 5 x 1015 cm‐3 and Na = 2 x 1016 
cm‐3.  Calculate  the  conductivity  of  the  semiconductor.  If  an  electric  field  is  E  =  100  V/cm  is 
applied,  calculate  the  drift  current  density.  Assume  electron  and  hole  mobilities  are  1350  and 
480 cm2/V.s, respectively. 
Conductivity of a semiconductor is given by, 
σ = q (nμ n + pμ p )
p = p 0 = N a − N d = 2 × 1016 − 5 × 10 15 = 1.5 × 10 16 cm −3
n2
n = n0 = i =
(
2.16 × 10 6 )
2

= 3.1× 10 − 4 cm −3
p0 1.5 × 1016
( )
Q p >> n, σ = q nμ n + pμ p ≈ qpμ p = 1.6 × 10 −19 × 1.5 × 10 16 × 480 = 0.768 S/cm
J Drift = σ • E = 0.768 • 100 = 76.8 A/cm 2
 
 
3. It  is  required  to  have  an  n‐type  semiconductor  with  resistivity  0.1  ohm‐cm.  Find  the  doping 
density needed to achieve this resistivity. If the semiconductor has a dimension of 1 μm х2 μm х 
10μm, calculate the resistance of the material. 

ρ=
1
=
1

1
(Assuming n >> p )
σ q (nμ n + pμ p ) qnμ n
1 1
⇒n= = = 4.63 ×1016 cm -3
qμ n ρ 1.6 ×10 ×1350 × 0.1
−19


⎢Note : p =
ni2 1.5 ×1010
=
2
(
= 4860,


)
n 4.63×10 16  
⎢ ⎥
⎢⎣so our original assumption n >> p is correct.⎥⎦

Resistance of the material,


10μm 10 ×10 − 4 cm
R = ρ = (0.1Ω.cm )× ( )
L
= 0 .1Ω.cm × = 5000Ω = 5 kΩ
A 1× 2 μm 2 1×10 − 4 × 2 ×10 − 4 cm 2
[Note: Units of dimensions must be converted into cm before the calculation to match 
with that of resistivity] 
 
4. A bar of Si semiconductor with length 10  μm has electron  concentration at  one end 1016 cm‐3 
and 8x1016 cm‐3 at the other end. Calculate the diffusion current density if the electron density 
varies linearly through the bar. Assume electron mobility 1350 cm2/V.s and T = 300 K. 
The diffuson current density is gven by, 
dn
J n , Diff . = qD n
, D n → Diffusion constant of electrons
dx
From Einstein relation,
Dn
μn
=
kT
q
⇒ Dn = μ n
kT
q
( )
= 1350 cm 2 / V.s × (0.0259 V ) = 34.96 cm 2 / s  

=
( =
)
dn 1016 − 8 × 1015 cm -3 2 × 1015 cm -3
= 2 × 1018 cm - 4
dx 10 μm 10 × 10 − 4 cm
⎛ ⎞
( )
∴ J n , Diff . = 1.6 × 10 −19 C × ⎜⎜ 34.96
cm 2
( )
⎟ × 2 × 1018 cm - 4 = 11.19 A/cm 2

⎝ s ⎠

[Note: Relatively small change in carrier concentration can cause large diffusion current] 
 
5. Consider a semiconductor that is nonuniformly doped with acceptor impurity atoms as shown in 
the figure below. If the semiconductor is in thermal equilibrium, draw the energy band diagram 
showing the intrinsic and the Fermi energy levels through the crystal.  Derive an expression for 
the induced electric field and show its direction in the diagram. 
 
If the nonuniformly doped semiconductor is in thermal equilibrium and has no external connections, 
the individual electron and hole currents must be zero. 

dp( x )
 
  J p = 0 = qp( x )μ p E x − eD p
dx
Ex is the induced electric field EInduced. 
Solving for Ex 
kT 1 dp( x )   ⎡ E − EF ⎤
p( x ) = ni exp ⎢ i
Ex = ⎥
q p( x ) dx   ⎣ kT ⎦
kT 1 ⎡ p(x ) dE i ⎤ dp  ( x ) ⎡ E − E F ⎤ d ⎛ Ei − E F ⎞
= = ni exp ⎢ i ⎜ ⎟
q p( x ) ⎢⎣ kT dx ⎥⎦  dx ⎣ kT ⎥⎦ dx ⎝ kT ⎠
1442443
  n(x )
1 dE i
=   p ( x ) ⎛ dEi dE F ⎞
q dx = ⎜ − ⎟
  kT ⎝ dx dx ⎠
  p ( x ) dEi
= ,
kT dx
   
⎛ dE F ⎞
⎜Q = 0, as the current is zero ⎟
  ⎝ dx ⎠
 

EInduced
 
 
 
 
 
 
 
 
 
 
 
 
 
 
[Note: It is not clear from the final expression of Ex = (1/q)(dEx/dx) that if Ex is positive or negative. But 
from the 1st line where Ex is expressed in terms of carrier density gradient (dp/dx), it can be said that Ex 
is  negative  since  (dp/dx)  is  negative.  So  Ex  will  point  towards  negative  x‐axis  and  the  energy  band 
diagram will have a negative slope.] 
6. An intrinsic Si sample is doped with donors from one side such that Nd = N0exp(‐ax).  (i) Find an 
expression for E(x) at equilibrium over the range for which Nd >> ni. (ii) Evaluate E when a = 1 
(μm)‐1.  (iii) Sketch a band diagram showing the intrinsic and the Fermi energy levels through the 
crystal and indicate the direction of E. 
kT 1 dN d ( x )
E (x ) = −
q N d ( x ) dx
=−
kT 1 d
[N exp(− ax )] For a = 1 (μm ) ,
−1
q N d ( x ) dx 0
= 1 (μm ) × 0.0259 V
kT −1
E=a
=−
kT 1
(− a )N 0 exp(− ax )      
q N d (x )
q
( −4
)
−1
= 1 10 cm × 0.0259 V
aN ( x )
kT 1
= = 259 V/cm
q N d (x ) d
kT
=a
q
[Note: • Electric field is expressed in units of V/cm. So the unit of a is converted into cm; 
•  The  induced  Electric  field  is  independent  of  the  position x  for  the  exponential     
distribution of the carrier density] 
kT 1 dEi dEi
E=a = ⇒ = akT  
q q dx dx
The  energy  band  diagram  will  have  a  constant  slope  of  +qakT.  Since  the  semiconductor  is  at 
thermal equilibrium, Fermi level will be flat, i.e.,  (dE F dx ) = 0 . 

 
 
 
 

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