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3 Population Mean Workbook

The sample estimates the mean number of large particle contaminants per wafer in the new production process is 1.86667. The 95% confidence interval for the mean number of large particle contaminants is between 1.37804 and 2.35530 large particles per wafer.

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John Smith
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108 views8 pages

3 Population Mean Workbook

The sample estimates the mean number of large particle contaminants per wafer in the new production process is 1.86667. The 95% confidence interval for the mean number of large particle contaminants is between 1.37804 and 2.35530 large particles per wafer.

Uploaded by

John Smith
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as XLSX, PDF, TXT or read online on Scribd
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A new production process is being tested to reduce the

number of “large” particles (2 microns and higher) that


contaminate silicon wafers. A random sample of n=90
wafers is drawn and the large contaminating particles
counted. The sample data are shown below.

a.

What is the sample estimate for the mean number of


large particle contaminants per wafer in the new
production process?
b. Calculate a 95% confidence interval for the mean
number of large particle contaminants per wafer in the
new production process

Large Particle Sample


Observation Contaminants Estimate S
1 3 1.866667 2.332959
2 1
3 6
4 1
5 3
6 3
7 0
8 0
9 0
10 4
11 0
12 3
13 0
14 1
15 3
16 0
17 0
18 2
19 1
20 0
21 0
22 6
23 12
24 3
25 1
26 3
27 2
28 2
29 1
30 8
31 2
32 0
33 0
34 0
35 4
36 1
37 2
38 0
39 0
40 7
41 4
42 1
43 4
44 1
45 0
46 3
47 2
48 0
49 2
50 1
51 3
52 5
53 0
54 3
55 1
56 0
57 2
58 0
59 1
60 0
61 2
62 0
63 1
64 1
65 2
66 0
67 0
68 10
69 2
70 1
71 0
72 0
73 0
74 7
75 2
76 4
77 1
78 1
79 0
80 5
81 0
82 1
83 2
84 0
85 5
86 0
87 0
88 0
89 1
90 2
a.

What is the sample estimate for the mean number


of large particle contaminants per wafer in the new
production process? 1.86667 (Large P.C.)
b.

Calculate a 95% confidence interval for the mean


number of large particle contaminants per wafer in
the new production process
Lower bound 1.37804 (Large P.C.)
Upper bound 2.35530 (Large P.C.) x-bar 1.866667
Alpha 0.05
S 2.332959
Sample Size 90
Confidence Interval
Lower 1.378038
Upper 2.355295

S (Sample
Large Particle Sample Standard
Observation Contaminants Estimate Deviation
1 3 1.866667 2.332958771
2 1
3 6
4 1
5 3
6 3
7 0
8 0
9 0
10 4
11 0
12 3
13 0
14 1
15 3
16 0
17 0
18 2
19 1
20 0
21 0
22 6
23 12
24 3
25 1
26 3
27 2
28 2
29 1
30 8
31 2
32 0
33 0
34 0
35 4
36 1
37 2
38 0
39 0
40 7
41 4
42 1
43 4
44 1
45 0
46 3
47 2
48 0
49 2
50 1
51 3
52 5
53 0
54 3
55 1
56 0
57 2
58 0
59 1
60 0
61 2
62 0
63 1
64 1
65 2
66 0
67 0
68 10
69 2
70 1
71 0
72 0
73 0
74 7
75 2
76 4
77 1
78 1
79 0
80 5
81 0
82 1
83 2
84 0
85 5
86 0
87 0
88 0
89 1
90 2

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