Chapter10 TRINITI
Chapter10 TRINITI
10.1 INTRODUCTION
The atmospheric pressure non-thermal plasma interacting with a surface is an extremely
intricate object for detailed modelling. Complexity of plasma-surface interaction at conditions
typical for polymer treatment consists in a wide variety of plasma and polymer surface parameters.
In particular, the sort of a plasma-forming gas varies according to a purpose of polymer surface
modification. Both, surface atomic profile and chemical composition of a monomer are different for
different polymers. Nowadays we have rudimentary knowledge about processes taking place on a
boundary between plasma and polymer bulk.
Generally, the plasma surface processing can be broken into following stages: 1) plasma
production; 2) transport of plasma activated gas to the polymer surface; 3) interaction of plasma
products with polymer surface. Respectively, a theoretical model of a whole technological process
can be reduced to a combination of specific models for each of the stages.
Recently, the plasma physics scientific community has paid much attention to the development
of atmospheric-pressure non-thermal plasma sources. Progress in this field is very rapid. A number
of overviews about non-thermal plasma production at atmospheric pressures and some applications
appeared recently [1-7].
Approaches to develop atmospheric pressures discharges operated at strongly non-equilibrium
conditions vary, and the spectrum of discharge devices already existing is rather broad. Starting
from the Dielectric Barrier Discharge (DBD, also called silent discharge) and corona discharges
known for more than hundred years, nowadays a number of different discharge techniques
succeeded in the development of devices, which are sources of non-thermal plasma at atmospheric
pressure. The interest in this topic is dictated by a potential economic benefit from numerous non-
thermal plasma technologies. It is anticipated that many of these (for example, protective coating
deposition, toxic and harmful gas decomposition, electromagnetic wave shielding, polymer and
fabric surface modifications, bio-medical applications, and so on) may gain a strong impetus and
rapid progress. Due to the wide variety of potential applications, requirements for the relevant
plasma parameters are also rather diverse.
Along with the progress in the discharge techniques the theory of gas discharge formation and
of plasma properties was developed. The specific feature of non-thermal plasma produced by the
DBD, corona, and glow discharge is high sensitivity of its characteristics to the sort of gas. In
contrast to thermal plasma, which can be completely characterized by a few parameters (gas
pressure, temperature, dissipated power density), the number of parameters required for a full
description of plasma properties is rather large. Typically, electron energy distribution is strongly
non-equilibrium, while ions have nearly the same average energy as atoms and molecules. Exactly,
free electrons effectively gain energy from the electric field, which further is dissipated in numerous
reactive collisions (excitation of molecular vibrations, dissociation, ionization and excitation of
electronic states of atoms and molecules). For correct description of non-thermal plasma it is
mandatory to treat properly electron kinetics.
Chemical kinetics of plasma involves many species produced in plasma including radicals and
excited atoms and molecules. Above-equilibrium concentrations of such species change completely
reactivity of gas in comparison with thermal kinetics and lead to appearance of a number of
transient compounds capable to react at nearly room temperature. Theoretical description of these
processes is possible provided the extensive knowledge about numerous rate coefficients is
accumulated. Hence, electron kinetics and plasma chemistry have a fundamental value for theory.
a
b
Figure 10.1a–b Atmospheric pressure plasma source No1 used for remote surface treatment outside
of discharge zone. a Side view of plasma source No1 in the streamer mode; ambient air, gas flow
velocity is 40m/s; average electric power is P=35-70 W; maximum length of streamer plasma jet in
air is about 3 cm. b The waveforms of discharge voltage and current of plasma source No1 in the
non-stationary streamer mode. Scales: voltage is 5 kV per unit, current is 200 mA per unit, time is
50 s per unit.
b
Figure 10.2a–b Information on steady-state atmospheric pressure plasma source No2. a Side view
of diffusive plasma jet generated by source No2 in pure (99.999%) nitrogen. b Longitudinal
distribution of gas temperature along plasma jet (x=0 is the nozzle of plasma source. Average
electric power is P=70 W; N2 flow velocity is 30m/s; diameter of plasma jet at outlet is about 8mm;
maximum length of diffusive plasma jet in pure nitrogen can reach 10-15 cm.
Plasma source No2 creates plasma jet in pure (99.999% of purity) nitrogen blowing out with
average velocity about of 30-50 m/s. In the experiments devoted to remote treatment this steady-
state atmospheric pressure plasma source was used only in diffusive mode. The length of plasma jet
depends on sort of ambient gas, and in the case of nitrogen this length can reach 15 cm.
Long-length plasma jet in pure nitrogen is an effective instrument for surface treatment. It
should be noted, however, our measurements revealed that composition of active species in nitrogen
plasma jet includes not only nitrogen excited molecules but other species as well generated in
plasma due to existence of trace admixtures like oxygen and hydrocarbons.
10.3.1 Introduction
Complexity of plasma description, in particular at high pressures is associated with two points:
(1) a vast amount of reactions taking place in plasma, which are very specific for given gas
composition; (2) non-uniformity of plasma in majority of discharge types. Evidently, taking into
account both of these points presents a formidable problem. Traditionally, an approach to modeling
of realistic plasma devices consists of two phases. At a first step, plasma is considered to be
uniform, and all transport processes are ignored. At this step, a major attention is paid to correct
description of electron kinetics and of initiated by electrons reactions of excited particles and
chemical radicals. Because of a strong difference in masses of electrons and neutral
molecules/atoms, even in a low electric field electrons are strongly heated, and their kinetics is
described by dynamics of an electron energy distribution function (EEDF). Molecular vibrations
can be easily excited by electron collisions. Provided relaxation of vibrational energy is slow,
vibrational degrees of freedom are non-equilibrium, too. This requires description of molecular
vibrations to be done in terms of a vibrational distribution function. Usually, rates of ion-molecular
reactions are remarkably higher than rates of reactions of neutral species. It means that despite
rather low number densities of charged particles, their role in plasma evolution can be significant.
The full kinetic model comprises self-consistent combination of electron and vibration kinetics in
terms of respective distribution functions with chemical and ion-molecular kinetics in terms of
reactive species concentrations. There are a few groups in the world doing full kinetic models:
Centro de Fizica dos Plasmas, Lisbon, Portugal; University of Bari, Italy; Centre de Physique
Atomique de Toulouse, France; Institute of Physics, Belgrade, Serbia, and the SRC TRINITI,
Troitsk, Russia.
Actually, for any specific system far not all processes are equally important. The full kinetic
model can be a good starting point for analyzing relative roles played by different species. An
additional analysis of a specific system at specified conditions (gas temperature, pressure and
composition, typical electric current density) allows one to make a significant simplification of a
model. Such a reduced model containing a reasonably small amount of reactions can be employed
on a second step for further analysis of effects of spatial non-uniformities and/or time variations.
For example, it was shown in [10], that for modeling of atmospheric pressure glow discharge in fast
dry airflow one may neglect plasma density gradients and describe evolution of plasma as it is
transported with the gas flow (plug-flow model). Such a plug-flow model was developed in [10-14]
for atmospheric air plasma. It was demonstrated a good agreement between theoretical predictions
and experimental measurements for fast airflow glow discharge.
The model incorporates kinetic equations for charged and neutral species including electrons,
positive and negative ions, molecules, excited species, and radicals. An efficiency of production of
the chemically active species is determined by an electron energy distribution function (EEDF)
formed by electric field and collisions with atoms and molecules. The EEDF is found numerically
by solving the electron Boltzmann equation. The influence of physical parameters such as gas
temperature, pressure, and applied electric field on the EEDF shape can be described adequately by
one combined parameter controlling practically all important discharge characteristics. This is the
value of the reduced electric field strength E/N, where E is the electric field strength and N is the
total gas density. Besides, gas chemical composition is an important factor, as well. For typical
conditions of plasma treatment, E/N parameter and gas composition change in time. Therefore, the
electron Boltzmann equation should be recalculated when necessary.
Generally, discharges producing non-thermal plasma at atmospheric pressure are inherently non-
uniform and proceed in a form of a manifold of micro-discharges (DBD) or as fast propagating
streamers (pulse coronas). However, location of micro-discharges in DBD is not fixed and varies
from pulse to pulse covering in average all electrode surface uniformly. Then it is reasonable to
employ a zero-dimensional model for simulation of evolution of a pulse repetitive single micro-
discharge with following averaging over whole discharge space. Such an approach allows one to
model plasma chemical processes in realistic gas mixtures. This approach was implemented
successfully for nitrogen oxides generation in pulse-periodic DBD [15].
In general, evolution of micro-discharges (MD) and streamers proceeds through formation of
self-organized transient structures controlled by correlations between electric field and spatial
charge distributions. All these factors make actual multi-dimensional modeling of discharges. Due
to complexity of space-time modeling, only simplest kinetic models can be included. Micro-
discharge dynamics in the DBDs of various geometries in oxygen has been numerically simulated
by 3D fluid models in collaborative work of [16]. Earlier theoretical studies are reviewed in [17].
2D approach to modeling the MDs is reported in [18]. Formation and evolution of streamers in
pulsed coronas were analyzed with help of 3D axial-symmetry fluid models by groups [19-24].
Typical diameters of an MD or streamers are 10-100 m, and typical times of their existence are
10-1000 ns. At such conditions, one has to include into consideration effects of gas dynamics and
dissipation processes like diffusion and thermal diffusion. M. Kushner [25] has made such
modeling for the MD in a metal-dielectric-metal cylindrical device in Ar atmosphere. It was found
that properties of the MDs are nearly the same as of classical glow discharge resulting in sensitivity
of plasma parameters to variations of secondary emission coefficients of the treated surface.
Actually, classic negative and positive corona discharges operate in a self-pulsation mode in a
wide range of conditions. In the negative corona these are widely known regular Trichel pulses [26]
and in positive coronas these are current oscillations in a number of gases.
In air at atmospheric pressure, effects of non-locality of electron and ion distributions and
diffusion processes, as well, could play some role only in the very vicinity of the point electrode. It
is known that the cathode layer parameters are insensitive to the kinetic model used. Therefore, the
simplest fluid model can be taken where all the transport and kinetic coefficients are functions of
the local value of E/N. To describe the pulse mode of the negative and positive point-to-plane
coronas it is sufficient to solve the well-known continuity equations for:
electrons ne/ t + div newe = ne + d nn, (1)
positive ions np/ t + div np wp= ne, (2)
negative ions nn/ t + div nn wn = ne - d nn,, (3)
and Poisson equation div E = e(np - ne - nn)/0, (4)
where the indexes e, p and n refer to electrons, positive and negative ions, respectively, np , ne
and nn are the positive ion, electron and negative ion number densities, wp, we and wn their drift
velocities, I, a, and d are the ionization, attachment, and detachment frequencies, e is the
electronic charge, 0 is the permittivity of free space. The electron drift velocity and kinetic
coefficients are to be determined from solving the electron Boltzmann equation, the ion drift
velocities are calculated using the known ion mobilities. The current in the external circuit, I, is
determined from the equation
V = U0 - RI, (5)
where V and U0 are the discharge and power supply voltage, R is the ballast resistor.
This relatively simple system of differential equations with transport and kinetic coefficients
calculated by an offline Boltzmann solver is rather hard for numerical simulations for typical
geometries of electrodes and/or plasma objects. The challenge to numerical methods is a very
strong variation in a size of the current channel as a function of time or distance. In a rigorous
approach one has to solve 3D space and time dependent equations. Such the approach was realized
for axial symmetry of discharges in [16, 19-24, 27]. Having knowledge from experiments about
structure of discharge, it is possible to reduce dimensionality of the mathematical problem. Such an
approach to modeling Trichel pulses in negative corona and self-oscillations in positive corona was
realized by authors [28-30]. Similar approach was employed in [31] to describe theoretically
corona-to-glow transition taking place in fast flow atmospheric pressure discharge with current
increase. In all these cases, using the shape of the current channel a rather good agreement was
achieved between predicted and observed discharge characteristics and parametric dependences of
pulse repetition frequencies and average currents.
Figure 10.3a–b The self-consistent reduced set of electron scattering cross sections: a for N2 [11]. 1
– momentum transfer including inelastic scattering processes; 2 – resonant vibrational excitation, 2’
near threshold vibrational excitation (process 11 in Table 2.5.1); 3 – A3+u electronic level
excitation (12); 4 – total electronic levels excitation with threshold higher than 7 eV (13); 5 –
dissociation (14); 6 – ionization (15); b for CO2 [37]. 1 – momentum transfer including inelastic
scattering processes; 2 – vibrational excitation (process 23 in Table 10.1); 3 - dissociative
attachment (26); 4 –dissociation (24); 5 – ionization (25).
The reduced sets of electron scattering cross sections appropriate for technological plasma
modeling are shown in Figures 10.3, 10.4. Usage of these reduced sets of cross sections allows us to
reproduce with a good accuracy (within a few percent) swarm data on electron drift velocity,
transverse and longitudinal diffusion coefficients and ionization and attachment coefficients, when
applicable. Comparison between calculated ionization and attachment coefficients for O 2 and H2O is
made in Figures 10.5, 10.6.
Figure 10.4 The self-consistent reduced set of electron scattering cross sections for H2O [37]. 1 –
momentum transfer including inelastic scattering processes; 2, - excitation rotational levels (process
16 in Table 2.5.1); 3, 4 – vibrational excitation (17, 18); 5, 6 - dissociative attachment with creative
O– and H– respectively (21, 22); 7 –dissociation (19); 8 – ionization (20).
a b
Figure 10.5a–b a Ionization coefficient as a function of E/N in H2O. Markers are experimental
data, solid line calculation with the reduced set of cross sections. + - [38]; ○ - [39]; ◊ - [40]. Here
the reduced electric field E/N is measured in the Td, 1 Td = 10-17 Vcm2. b Dissociative electron
attachment coefficient as a function of E/N in H2O. Markers are experimental data, solid line
calculation with the reduced set of cross sections. + - [38]; ○ - [39]; ◊ - [40], Δ - [41]; × - [42]. Here
the reduced electric field E/N is measured in the Td, 1 Td = 10-17 Vcm2.
Numerical solving of the BE for the EEDF allows one to calculate rate coefficients of
elementary processes involving electrons (see Table 10.1) as a function of E/N.
Figure 10.6 Dissociative electron attachment (η/N) and ionization (α/N) coefficients as a function
of E/N in O2. Markers are experimental data, solid line calculation with the reduced set of cross
sections. ○- compilation: [39]; □ - [43]; Δ - [44]; ◊ - [45]; - [46]; - [47]. Here the reduced
electric field E/N is measured in the Td, 1 Td = 10-17 Vcm2.
O + O2 + O2 ® O3 + O2 8.6×10-31×T-1.25 [53]
O + O2 + N2 ® O3 + N2 5.6×10-29×T-2 [53]
O + O3 ® O2 + O2 9.5×10-12×exp(-2300/T) [54]
[52]
6.3×10-12×exp(-2300/T) [54]
O + O3 ® O2(a1D) + O2
[52]
3.2×10-12×exp(-2300/T) [54]
O + O3 ® O2(b1S) + O2
[52]
O + NO + M ® NO2 + M 9.1×10-28×T-1.6 [55]
1.7×10-11 [51]
O + NO3 ® NO2 + O2
10-11 [54]
[56]
O(1D) + NO ® O2 + N 8.5×10-11
4×10-17 [55]
O2(b1S) + O2 ® O2 + O2
1.5×10-16 [57]
2.8×10-11 [56]
N2(A3S) + NO ® N2 + NO [51]
1.5×10-10
1.4×10-11 [56]
N2(A3S) + N2O ® N2 + N2 + O
8×10-11 [51]
N + NO ® N2 + O 3.1×10-11 [60]
N + O2 ® NO + O 1.1×10-14×T×exp(-3150/T) [54]
10-15 [53]
N + O3 ® NO + O2
5.7×10-13 [54]
N + N + M ® N2 + M 8.3×10-34×exp(500/T) [54]
N + O + M ® NO + M 1.8×10-31×T-0.5 [54]
N2 + M ® N + N + M 6.1×10-3×T1.6×exp(-113200/T) [54]
NO + M ® N + O + M 6.6×10-4×T-1.5×exp(-75500/T) [54]
a b
Figure 10.7a–b a Total optical spectrum in UV and visible region of a radiation emitted from
plasma jet in airflow (plasma source No1). Gas flow velocity is 50 m/s. Discharge power is 35 W.
b Longitudinal emission intensity distribution of active species in the air plasma jet. Coordinate x=0
is the outlet of the source. 1 - N2(C3u, v`=0 B3g, v``=0) transition, λ=337.1 nm, N2 second
positive system; 2 - О(5S05P) transition, λ=777.2nm; 3 - OH(A2Σ+, v`=0X2П, v``=0) transition,
λ=306nm.
Spectroscopic information on UV and visible light emission from the middle of discharge zone
of N2-plasma source is shown in Figure 10.8a. Main input to emission from this region corresponds
to 1+ and 2+ systems of nitrogen. Low intensity emission of CN is recorded only from the region
close to the outlet of discharge zone (see Figure 10.8b). Afterglow UV and visible spectrum of a
radiation emitted from N2-plasma jet at different distances away from the outlet of the plasma
source nozzle are presented in Figure 10.9. We would like to attract serious attention to a surprising
fact in afterglow: despite high purity of nitrogen (99.999%) used as plasma forming gas the light
emission in spectral lines does not correlate with emission from the excited states of nitrogen itself
as it shown in Figure 10.8a. The very small impurities of radicals CN and NH give main
contribution to the light emission from active N2 plasma jet afterglow at atmospheric pressure. It
means that small impurities in pure gas can influence strongly on the efficiency of plasma
treatment.
a b
Figure 10.8a–b a UV and visible spectrum of a radiation emitted from the middle of discharge
zone (plasma source No2). Discharge power is 70 W. Gas flow rate of nitrogen is 440 cm3/s.
b Change in intensity of CN spectrum with location of the emitting discharge region inside plasma
source No2. 1 – region close to the inlet; 2 - region close to the outlet.
a b
Figure 10.9a–b Afterglow UV and visible spectrum of a radiation emitted from N2-plasma jet
(plasma source No2) at different distances away from the outlet of the plasma source nozzle.
Discharge power is 70 W. Gas flow rate of nitrogen is 440 cm3/s. a 1.5 mm away from nozzle. b 10
mm away from nozzle.
As one can see in Figure 10.9a, the light emission at short distances from the nozzle is caused,
mainly, by radicals CN and NH while at the longer distances (10 mm or more) the essential
contribution to the plasma emission is made by NO (γ-band) (see Figure 10.9b).
Under plasma processing, narrow N2-plasma jet strikes the sample, expands over the surface and
occupies large area. It is interesting therefore to know a radial distribution of active species and gas
temperature in plasma over the treated zone. Such kind of experimental information is presented in
Figure 10.10.
a b
Figure 10.10a–b Radial distribution: a of light intensity of CN(B2Σ+ → X2Σ+) (1) and
NH(A3П→ X2Σ+) (2) emitted from N2-plasma jet expanded over the surface to be treated. b of gas
temperature in plasma jet expanded over the surface to be treated. The surface is placed at a
distance of 3 mm away from nozzle of plasma source. Discharge power is 70 W. Gas flow rate of
nitrogen is 440 cm3/s.
So, due to an existence in pure nitrogen of trace gaseous admixtures like CH 4, H2O, O2, plasma
composition can be changed drastically. Our experimental results presented above prove
unambiguously that small gas additives play crucial role in generation by plasma of active species,
and their interaction with polymer surface has to be taken therefore into account in theory and
practice.
Another subject of our investigations is CF 4 that is widely used as plasma forming gas in the
DBD-systems for hydrophobic processing of the fabrics and polymers. Purity of CF4 used in the
experiments is 99.5%, and air is the dominant impurity in CF 4 (about 0.5%). Survey spectrum of
light emitted from DBD-plasma in gas mixture CF 4 (99.5% CF4 + 0.5% air) for wavelength range
from 240 nm to 800 nm is shown in Figure 10.11.
Figure 10.11 Survey UV-visible emission spectra from DBD. Pressure of working gas P=1.2atm.
Gas mixture is 99.5% CF4 and 0.5% air.
Emission spectra with higher resolution in two wavelength ranges 240 nm – 450 nm and 450 nm
– 800 nm for two gas mixtures (99.5% CF4 + 0.5% air) and (10% CF4 and 90% nitrogen) are
presented in Figure 10.12. One can see that CF3-radicals give the major input in the light emission
from DBD-plasma in gas mixtures containing CF4. It should be noted that spectral lines of N2-
second positive system emitted from gas mixture (99.5% CF4 + 0.5% air) appear due to air
admixture.
For gas mixture (99.5% CF4 + 0.5% air), broad band emission of CF3-radical is seen clearly in
Figure 10.12b. Atomic spectral lines of the ionized oxygen observed in the spectrum appear
probably due to admixture of air in the working gas mixture. For comparison, emission spectrum of
pure nitrogen is shown in Figure 10.12b as well.
a b
Figure 10.12a–b The emission spectrum from DBD-plasma in gas mixtures containing CF4. Total
gas pressure P=1.2atm. 1 – 99.5% CF4 and 0.5% air; 2 – 10% CF4 and 90% nitrogen; 3- pure
nitrogen. a in the range 250-450 nm; b in the range 450-800 nm.
10.3.5 INFLUENCE OF IMPURITIES ON COMPOSITION OF GAS
ACTIVATED BY NON-THERMAL PLASMA
One of important parameters, which can serve for optimization of the plasma surface treatment
is a buffer (transportation) gas. A key criterion for buffer gas choice is a feasibility to realize high
reduced energy input in non-thermal discharge. Besides, the energy consumed by the buffer gas
should effectively used for production of chemically active species and UV radiation. In
experiments, there are a lot of factors making it difficult to identify mechanisms for observed
variations of discharge treatment efficiency of a specific surface. Theoretical modelling can
elucidate significantly analyses of experimental observations.
Here an example is considered when experimentally observed [61] high efficiency of PP and
PET surfaces treatment by a glow discharge in “pure” nitrogen can be explained by existence in this
nitrogen of traces of other species at ppm level. It was revealed experimentally (Figures 10.8, 10.9)
that plasma emission spectrum of this discharge exhibits molecular systems of species, which can
appear only from impurities.
Specification of gas composition supplied by manufacturers in high-pressure vessels is usually
given by the supplier. Typical level of small admixture is on the level of a few ppm. In particular, in
so-called “pure” nitrogen there exist different admixtures like O2, H2O, CH4 and other
hydrocarbons. To evaluate the role of these admixtures in discharge products formation, simulations
were performed for conditions close to our experiments with micro-streamer discharge for additions
of O2, H2O and mixture of all three components.
It was found that at the afterglow phase atomic oxygen decays rather fast due to conversion to
ozone. As a result, at time 69 s atomic oxygen concentration in polluted (10 ppm O2) nitrogen is
higher than in air. It is interesting to find a maximum in oxygen atom concentration in N 2 with
variable concentration of O2. Actually, this maximum depends on the moment when the
measurement was done. Figure 10.13a shows the dependence of oxygen atom number density on
concentration O2 in the mixture O2:N2 at the moment 100 s after electric discharge. There is the
pronounced maximum of oxygen atom concentration 3.6·1016 cm-3 at the concentration O2 equal to
0.5%. For comparison, the oxygen atom concentration is equal to 2.4·1014 cm-3 and 1.7·1014 cm-3 for
initial concentration O2 5 ppm and 20% (synthetic air), correspondingly. Using mixture 0.5%O2-N2,
which is typical for so-called “commercial purity nitrogen”, the oxygen atom density increases 200
times in comparison with dry air. In our calculation we used the electrical circuit with the fixed
parameters: discharge capacity, charging voltage on the discharge capacity and others. During
variation gas mixture in our simulation the input discharge energy was changed in the range 600-
750 J/liter.
a b
Figure 10.13a–b Dependence of oxygen atom (a), radicals and active molecules (b) number
density on concentration of O2 in the mixture O2:N2 at two moments after electric discharge. Solid
line – 100 s, dashed line – 1s. P0 = 1 atm, T0 = 300 K, Ein = 600 J/liter.
Figure 10.13b shows dependence of radical and active molecule number densities on
concentration O2 in the mixture O2:N2 at the time 1 s and 100 s after electric discharge. In
comparison with Figure 10.13a, Figure 10.13b uses the logarithmical scale. The first moment (1 s)
corresponds to the end of discharge. The second moment (100 s) approximately corresponds to the
time of transport plasma to the surface of the processed film.
a b
Figure 10.14a–b a Radical and active molecule number density as a function of H2O in the
mixture H2O with dry air at two moments after electric discharge. Dashed line – 1s, solid line –
100 s. Conditions are as for Figure 10.13. b Atom and molecule number density as a function of
time for the mixture of nitrogen and 5 ppm CH4, 5 ppm O2, 5 ppm H2O.
Figure 10.14a shows dependence of radical and active molecule number densities on
concentration of H2O in the mixture H2O with dry air at the moments 1 s and 100 s after electric
discharge. Presence of a few percent of H2O in the air decreases the oxygen atom density 10 times
at the moment 100 s. The number density of OH radicals increases with increasing concentration
of H2O. At the initial concentration of H2O 5%, the OH radical number density at the moment 100
s is of the same order as the oxygen atom number density.
Simulations were performed also for nitrogen with additions of CH4, O2, and H2O with equal
concentrations 5 ppm. Respectively, our data base on electron scattering cross sections was
extended by inclusion of a self-consistent set of cross sections for CH4 molecules. It is seen from
Figure 10.14b that admixture molecules are destroyed in afterglow phase in more degree than in the
discharge (about 0.5 s). This is the typical situation for impurities, which are removed in reactions
with active species produced in the discharge from the main components. Time behavior of a
number of radicals produced in the discharge and afterglow is illustrated in Figure 2.5.24.
Figure 10.15 Radical number density as a function of time for the mixture of nitrogen and 5 ppm
CH4, 5 ppm O2, 5 ppm H2O. Conditions are as for Figure 10.13.
The amount and sort of radicals approaching the surface can vary strongly with change of gas
composition. In particular, small admixtures (O2, H2O, CxHy) to pure gases, such as Ar or N2, can
significantly influence on the activation doze. Our numerical data demonstrate an opportunity to
increase processing efficiency by a proper choice of the components of work gas mixture.
Table 10.4. Examples (symbol * designates chemical vacant site) of surface radicals structure
“In chain” tertiary alkyl radical “End free” primary alkyl radical
H H H H
*
-
-
-
- - C C ~
*
~ C C C ~
-
-
-
-
H CH3
H CH3 H
“In chain” secondary alkyl radical “End free” secondary alkyl radical
H H H H
- *
- -
- -
- -
- -
- -
C C C ~ ~ C C
*
~
H CH3 H H CH3
“In chain” tertiary alkoxy radical “End free” secondary alkoxy radical
*
H O H
H H
-
-
-
~ C - C - C ~
- -
-
-
~ C C O
*
-
-
-
H CH3 H
-
-
H CH3
In description of reactions “in chain” radicals and groups are designated using term PP. For
example: PP* is in chain alkyl radical, PPO* is in chain alkoxy radical and so on. For designation
of “end free” groups and radicals the term R is used. For example: R* is end free alkyl radical,
ROO* is end free peroxy radical and so on. If it will be necessary to indicate explicitly the type of C
atom (primary, secondary or tertiary) with a given group or radical, then the terms 1PP, 2PP, 3PP,
1R and 2R will be used. For example, 2PPO* is secondary in chain alkoxy radical. Let us note that
the type of end free C atoms can be only primary or secondary (see Table 10.4). The full list of
processes taken into account in the model is presented in Table 10.5.
Table 10.5. Processes included in the kinetic model for the plasma treatment of PP film in
atmospheric pressure discharge in air
Rate constants (cm2/s), Comments,
Processes frequencies (s-1) or ref.
probability
1 3PP + O => 3PP* + OH 0.001 [66]
2 2PP + O => 2PP* + OH 10-4 [66]
3 1PP + O => 1PP* + OH 10-5 [66]
4 3PP + OH => 3PP* + H2O 0.25 [66]
5 2PP + OH => 2PP* + H2O 0.05 [66]
6 1PP + OH => 1PP* + H2O 0.0025 [66]
7 3PP* + O => 3PPO* 0.1 [66]
8 2PP* + O => 2PPO* 0.01 [66]
9 1PP* + O => 1PPO* 0.01 [66]
10 3PP* + O3 => 31PPO* + O2 1 [66]
11 2PP* + O3 => 2PPO* + O2 0.5 [66]
12 1PP* + O3 => 1PPO* + O2 0.5 [66]
13 3PP* + O2 => 3PPOO* 0.001 [66]
14 2PP* + O2 => 2PPOO* 2.3 10-4 [66]
15 1PP* + O2 => 1PPOO* 5. 10-4 [66]
16 3PP* + H => 3PP 0.2 [66]
17 2PP* + H => 2PP 0.2 [66]
18 1PP* + H => 1PP 0.2 [66]
19 3PP* + OH => 3PPOH 0.2 [66]
20 2PP* + OH => 2PPOH 0.2 [66]
21 1PP* + OH => 1PPOH 0.2 [66]
22 3PPOH + O => 3PPO* + OH 7.5 10-4 [66]
23 2PPOH + O => 2PPO* + OH 7.5 10-4 [66]
24 1PPOH + O => 1PPO* + OH 7.5 10-4 [66]
25 3PPOH + OH => 3PPO* + H2O 8.2 10-3 [66]
26 2PPOH + OH => 2PPO* + H2O 8.2 10-3 [66]
27 1PPOH + OH => 1PPO* + H2O 8.2 10-3 [66]
28 3PPOO* + 3PP => 3PPOOH + 3PP* 5.5 10-16 cm2/s [66]
29 2PPOO* + 2PP => 2PPOOH + 2PP* 5.5 10-16 cm2/s [66]
30 1PPOO* + 1PP => 1PPOOH + 1PP* 5.5 10-16 cm2/s [66]
31 3PPO* + 3PP => 3PPOH + 3PP* 8. 10-14 cm2/s [66]
32 2PPO* + 2PP => 2PPOH + 2PP* 8. 10-14 cm2/s [66]
33 1PPO* + 1PP => 1PPOH + 1PP* 8. 10-14 cm2/s [66]
34 1PPOO* + NO => 1PPO* +NO2 0.02 [67]
35 2PPOO* + NO => 2PPO* +NO2 0.02 [67]
36 3PPOO* + NO => 3PPO* +NO2 0.02 [67]
37 3PPO* => 3PPO + 1R* 500 s-1 [66]
(3PPO – Ketones)
38 2PPO* => 2R* + 2PPO 10 s-1 [66]
(2PPO – Aldehydes)
39 2PPO + O => *2PPO + OH 0.04 [66]
(*2PPO – carbonyl radicals)
40 2PPO + OH => *2PPO + H2O 0.4 [66]
41 *2PPO + O => A* + CO2 0.4 [66]
42 *2PPO + OH => OH2PPO 0.12 [66]
(OH2PPO – acids)
43 1PPOO* + HO2 => 1PPOOH + O2 0.01 See the text
44 2PPOO* + HO2 => 2PPOOH + O2 0.01 See the text
45 3PPOO* + HO2 => 3PPOOH + O2 0.01 See the text
46 1PPO* + HO2 => 1PPOH + O2 0.01 See the text
47 2PPO* + HO2 => 2PPOH + O2 0.01 See the text
48 3PPO* + HO2 => 3PPOH + O2 0.01 See the text
49 1PPOO* + OH => 1PPOH + O2 0.01 Estimate
50 2PPOO* + OH => 2PPOH + O2 0.01 Estimate
51 3PPOO* + OH => 3PPOH + O2 0.01 Estimate
52 1PPO* + OH => 1PPOOH 0.001 Estimate
53 2PPO* + OH => 2PPOOH 0.001 Estimate
54 3PPO* + OH => 3PPOOH 0.001 Estimate
55 1PPOO* + 1PPOO* => 1PPOO1PP + O2 10-15 cm2/s Estimate
56 1PPOO* + 2PPOO* => 1PPOO2PP + O2 10-15 cm2/s Estimate
57 1PPOO* + 3PPOO* => 1PPOO3PP + O2 10-15 cm2/s Estimate
58 2PPOO* + 2PPOO* => 2PPOO2PP + O2 10-15 cm2/s Estimate
59 2PPOO* + 3PPOO* => 2PPOO3PP + O2 10-15 cm2/s Estimate
60 3PPOO* + 3PPOO* => 3PPOO3PP + O2 10-15 cm2/s Estimate
61 1PPO* + 1PPO* => 1PPOO1PP 10-15 cm2/s Estimate
62 1PPO* + 2PPO* => 1PPOO2PP 10-15 cm2/s Estimate
63 1PPO* + 3PPO* => 1PPOO3PP 10-15 cm2/s Estimate
64 2PPO* + 2PPO* => 2PPOO2PP 10-15 cm2/s Estimate
65 2PPO* + 3PPO* => 2PPOO3PP 10-15 cm2/s Estimate
66 3PPO* + 3PPO* => 3PPOO3PP 10-15 cm2/s Estimate
67 1PPOO* + 1PPO* => 1PPO1PP + O2 10-15 cm2/s Estimate
68 1PPOO* + 2PPO* => 1PPO2PP + O2 10-15 cm2/s Estimate
69 1PPOO* + 3PPO* => 1PPO3PP + O2 10-15 cm2/s Estimate
70 2PPOO* + 1PPO* => 2PPO1PP + O2 10-15 cm2/s Estimate
71 2PPOO* + 2PPO* => 2PPO2PP + O2 10-15 cm2/s Estimate
72 2PPOO* + 3PPO* => 2PPO3PP + O2 10-15 cm2/s Estimate
73 3PPOO* + 1PPO* => 3PPO1PP + O2 10-15 cm2/s Estimate
74 3PPOO* + 2PPO* => 3PPO2PP + O2 10-15 cm2/s Estimate
75 3PPOO* + 3PPO* => 3PPO3PP + O2 10-15 cm2/s Estimate
76 1R* + O => 1RO* 0.1 [68]
77 1R* + O2 => 1ROO* 0.01 [68]
78 1R* + O3 => 1RO* + O2 0.001 Estimate
79 2R* + O => 2RO* 0.1 [68]
80 2R* + O2 => 2ROO* 0.01 [68]
81 2R* + O3 => 2RO* + O2 0.001 Estimate
82 1R* + OH => 1ROH 10-5 [68]
83 2R* + OH => 2ROH 10-5 [68]
84 1RO* + HO2 => 1ROH + O2 0.01 Estimate
85 1RO* + OH => 1ROOH 0.001 Estimate
86 2RO* + HO2 => 2ROH + O2 0.01 Estimate
87 2RO* + OH => 2ROOH 0.001 Estimate
88 1ROO* + HO2 => 1ROOH + O2 0.01 Estimate
89 1ROO* + OH => 1ROH + O2 0.01 Estimate
90 2ROO* + HO2 => 2ROOH + O2 0.01 Estimate
91 2ROO* + OH => 2ROH + O2 0.01 Estimate
92 2ROO* + NO => 2RO* + NO2 0.02 Estimate
93 1ROO* + NO => 1RO* + NO2 0.02 Estimate
94 1RO* + 1PP => 1ROH + 1PP* 10-16 cm2/s Estimate
95 1RO* + 2PP => 1ROH + 2PP* 10-15 cm2/s Estimate
96 1RO* + 3PP => 1ROH + 3PP* 10-15 cm2/s Estimate
97 2RO* + 1PP => 2ROH + 1PP* 10-16 cm2/s Estimate
98 2RO* + 2PP => 2ROH + 2PP* 10-15 cm2/s Estimate
99 2RO* + 3PP => 2ROH + 3PP* 10-15 cm2/s Estimate
100 1ROO* + 1PP => 1ROOH + 1PP* 10-16 cm2/s Estimate
101 1ROO* + 2PP => 1ROOH + 2PP* 10-15 cm2/s Estimate
102 1ROO* + 3PP => 1ROOH + 3PP* 10-15 cm2/s Estimate
103 2ROO* + 1PP => 2ROOH + 1PP* 10-16 cm2/s Estimate
104 2ROO* + 2PP => 2ROOH + 2PP* 10-15 cm2/s Estimate
105 2ROO* + 3PP => 2ROOH + 3PP* 10-15 cm2/s Estimate
106 1ROO* + 1PPOO* => 1ROO1PP + O2 10-15 cm2/s Estimate
107 1ROO* + 2PPOO* => 1ROO2PP + O2 10-15 cm2/s Estimate
108 1ROO* + 3PPOO* => 1ROO3PP + O2 10-15 cm2/s Estimate
109 2ROO* + 1PPOO* => 2ROO1PP + O2 10-15 cm2/s Estimate
110 2ROO* + 2PPOO* => 2ROO2PP + O2 10-15 cm2/s Estimate
111 2ROO* + 3PPOO* => 2ROO3PP + O2 10-15 cm2/s Estimate
112 1RO* + 1PPOO* => 1RO1PP + O2 10-15 cm2/s Estimate
113 1RO* + 2PPOO* => 1RO2PP + O2 10-15 cm2/s Estimate
114 1RO* + 3PPOO* => 1RO3PP + O2 10-15 cm2/s Estimate
115 2RO* + 1PPOO* => 2RO1PP + O2 10-15 cm2/s Estimate
115 2RO* + 2PPOO* => 2RO2PP + O2 10-15 cm2/s Estimate
117 2RO* + 3PPOO* => 2RO3PP + O2 10-15 cm2/s Estimate
118 1ROO* + 1PPO* => 1RO1PP + O2 10-15 cm2/s Estimate
119 1ROO* + 2PPO* => 1RO2PP + O2 10-15 cm2/s Estimate
120 1ROO* + 3PPO* => 1RO3PP + O2 10-15 cm2/s Estimate
121 2ROO* + 1PPO* => 2RO1PP + O2 10-15 cm2/s Estimate
122 2ROO* + 2PPO* => 2RO2PP + O2 10-15 cm2/s Estimate
123 2ROO* + 3PPO* => 2RO3PP + O2 10-15 cm2/s Estimate
124 1ROO* + 1ROO* => 1RO* + 1RO* + O2 10-15 cm2/s Estimate
125 1ROO* + 2ROO* => 1RO* 2RO* + O2 10-15 cm2/s Estimate
126 2ROO* + 2ROO* => 2RO* + 2RO*+ O2 10-15 cm2/s Estimate
127 1R* + 1R* => 1R1R 10-15 cm2/s [68]
128 2R* + 2R* => 2R2R 10-15 cm2/s [68]
129 1R* + 2R* => 1R2R 10-15 cm2/s [68]
The brief description of the reaction mechanism for the PP treatment in air plasma proposed in
papers [66, 67] is the following. The modification of PP surface is started with the abstraction of H
atoms by O atoms and OH radicals and, respectively, production of alkyl radicals PP* (nos 1-6 in
Table 10.5):
PP + O => PP* + OH
PP + OH => PP* + H2O
The alkyl radicals react with O and O3 to form alkoxy radicals PPO*, with O2 to produce peroxy
radicals PPOO*, with OH to form alcohols PPOH and with H to regenerate PP monomer (nos 7-21
in Table 10.5):
PP* + O => PPO*
PP* + O3 => PPO* + O2
PP* + O2 => PPOO*
PP* + OH => PPOH
PP* + H => PP
Further reactions of the alcohol groups with O and OH radicals result in the abstraction of
hydrogen atoms and formation of alkoxy radicals (nos 22-27 in Table 10.5):
PPOH + O => PP* + OH
PPOH + OH => PPO* + H2O
The peroxy radicals can abstract hydrogen atoms from neighboring sites to produce
hydroperoxide groups PPOOH and alkyl radicals. The similar processes take place for the alkoxy
radicals, i.e. alkoxy radicals abstract hydrogen atoms from neighboring sites to form, respectively,
alcohol groups and alkyl radicals (nos 28-33 in Table 10.5):
PPOO* + PP => PPOOH + PP*
PPO* + PP => PPOH + PP*
Besides, peroxy radicals can react with NO molecules to produce alkoxy radicals (nos 34-36 in
Table 10.5):
PPOO* + NO => PPO* + NO2
There are also backbone scission processes due to the reactions of alkoxy radicals with PP
backbone, scissions on tertiary carbon atoms lead to the formation of ketones ~(CH3)C=O (no 37
in Table 10.5)
- *
H O H H O H
=
-
~ C - C - C ~ => ~ C - C + C ~
*
-
H CH3 H H CH3 H
and scissions on secondary carbon atoms result in aldehydes ~HC=O (no 38 in Table 10.5)
*
H O H H H O H H
=
- - - - -
-
~ C C C C ~ => ~ C C + C C ~
*
-
- =
* =
- -
- -
- -
~ C C + O => ~ C C + OH
CH3 H CH3
H O H O
- =
* =
- -
- -
- -
~ C C + OH => ~ C C + H2 O
CH3 H CH3
These carbonyl radicals further react with O atoms to produce CO2 molecules and respective
remainder radicals, i.e. the model includes the processes resulting in etching of PP surface (no 41
in Table 10.5).
H O H
* =
-
-
-
~ C C + O => ~ C + CO2
*
-
CH3
-
CH3
Carbonyl radicals can also react with OH to form acids ~(OH)C=O (no 42 in Table 10.5).
H O H O
* =
- - - =
- -
- -
~ C C + OH => ~ C C
CH3 CH3 OH
Along with formation of ketones and aldehydes, backbone scission reactions lead also to the
appearance of remainder radicals 1R* and R2*. Processes with these radicals are not considered in
[66].
Rate constants, frequencies and probabilities for the reactions discussed above were taken the
same as in [66, 67]. It should be also noted that in our previous paper [70] the only these reactions
were taken into account in the kinetic model.
In present paper a number of processes are included in the model in addition to reaction
mechanism presented in [66, 67, 70]. According to results of discharge modeling, in humid air
plasma a noticeable amount of HO2 radicals is formed and these radicals can react with peroxy and
alkoxy radicals to form hydroperoxides and alcohols, respectively [69], (nos 43-48 in Table 10.5):
PPOO* + HO2 => PPOOH + O2 (6)
PPO* + HO2 => PPOH + O2 (7)
To estimate the probabilities of these reactions we have looked for analogous gas phase chemical
reactions. It appeared that the rate constants for the gas phase reactions like
HO2 + CH3C(O)CH2OO* => CH3C(O)CH2OOH + O2
HO2 + (CH3)3CCH2OO* => (CH3)3CCH2OOH + O2
are about 10-11 cm3/s [71], so the probability for the reaction (1) is expected to be high. The value of
this probability was estimated in the following manner [66]. It was assumed that a unit surface
reaction probability corresponds to a gas phase kinetic rate constant ( 10-10 cm3s-1). Then the
surface reaction probability for the reaction (6) can be as high as 0.1. In our model correspondent
probability was taken as 0.01. Unfortunately, we have not found analogous gas phase chemical
reactions for the process (7), so the correspondent probability was taken the same as for the process
(6). It should be noted that in paper [68] the probability for the reaction (6) is taken as 10 -5 and
probably is underestimated. The authors did not explain the reason of such a choice.
Termination reactions also occur between OH gas radical and alkoxy and peroxy surface
radicals [69] (nos 49-54 in Table 10.5):
PPOO* + OH => PPOH + O2 (8)
PPO* + OH => PPOH (9)
The probabilities of these processes were taken as 0.01 and 0.001 respectively.
As it is pointed out in paper [69], the termination of alkoxy and peroxy radicals can occur by
bimolecular recombination (nos 55-75 in Table 10.5):
PPO* + PPO* => PPOOPP (10)
PPO* + PPOO* => PPOPP + O2 (11)
PPOO* + PPOO* => PPOOPP + O2 (or PPO* + PPO* + O2 ) (12)
As for the reaction (12), for the “in chain” peroxy radicals the first reaction channel is taken into
account and for the “end free” peroxy radicals the second one is assumed (see below). The rate
constants for the processes (10)-(12) was taken as 10-15 cm2/s.
If the polymer peroxy and/or alkoxy radicals are in neighbouring positions, they recombine to
form stable cyclic peroxides or expoxides [69]. For example:
*
O O
-
H O O H H O - O H
-
~ C - C - C - C ~ => ~ C - C - C - C ~ + O2
-
O
*
-
H O O H H O H
-
~ C - C - C - C ~ => ~ C - C - C - C ~ + O2
-
Reactions between peroxy and/or alkoxy radicals in different polymer chains cause cross
linking. Let us also note that reactions between two peroxy radicals and between peroxy radicals
and HO2 gas radicals can also lead to formation of C=O groups [69]. At present these processes are
not included in the kinetic model.
Processes with the participation of “end free” radicals are also included in the model. These
reactions are similar to that for “in chain” radicals. The following processes are taken into account.
Formation of alkoxy and peroxy radicals in reactions with active plasma species (nos 76-81 in
Table 10.5):
R* + O => RO* (13)
R* + O2 => ROO* (14)
R* + O3 => RO* + O2 (15)
Formation of alcohols and hydroperoxides in reactions with active plasma species (nos 82-91 in
Table 10.5):
R* + OH => ROH (16)
RO* + OH => ROOH (17)
RO* + HO2 => ROH + O2 (18)
ROO* + OH => ROH + O2 (19)
ROO* + HO2 => ROOH + O2 (20)
Decay of “end free” peroxy radicals in reactions with NO molecules (nos 92-93 in Table 10.5):
ROO* + NO => RO* + NO2 (21)
Abstraction of H atoms from polymer surface by “end free” alkoxy and peroxy radicals (nos 94-105
in Table 10.5):
RO* + PP => ROH + PP* (22)
ROO* + PP => ROOH + PP* (23)
Recombination reactions between “end free” and “in chain” alkoxy and peroxy radicals, these
reactions lead to cross linking (nos 106-123 in Table 10.5):
ROO* + PPOO* => ROOPP + O2 (24)
ROO* + PPO* => ROPP + O2 (25)
RO* + PPOO* => ROPP + O2 (26)
RO* + PPO* => ROOPP + O2 (27)
Recombination reactions between “end free” peroxy radicals (nos 124-126 in Table 10.5):
ROO* + ROO* => RO* + RO* + O2 (28)
Corresponding probabilities and rate constants were partially taken from [69] and partially were
assigned by ourselves by analogy with “in chain” radical reactions. It was assumed that the typical
value of rate constant is 10-15 cm2/s.
Alkyl radicals can react with each other to crosslink. We included in the model crosslink processes
for the “end free” alkyl radicals (nos 127-129 in Table 10.5) with an estimated rate of 10-15 cm2/s
[68].
R* + R* => RR (29)
It should be noted that the role of these processes under considered conditions (atmospheric
pressure air discharge) is minor and the density of cross-linked alkyl radicals is small, since the rate
of the alkyl radicals decay due to reactions with active plasma species is essentially higher than the
rate of cross linking.
Evolution of surface densities of different functional groups (including H-sites) with treatment
time was calculated by numerical solving of system of balance equations [70]:
, i = 1, 2, 3 …M, (30)
where Ni [cm-2] is the surface concentration of i-th functional group and M is the number of
functional groups considered in the model. The terms in the right hand side of equation (30)
describe the total rates of production and loss of the i-th functional group.
The kinetic model described includes reactions of three different types: (I) reactions between
plasma species and surface species (including etching); (II) reactions between different surface
species and (III) chain backbone scission reactions due to interaction of surface species with
polymer backbone. The explicit expressions for the corresponding terms on the right hand side of
(30) depend on the type of reaction. Let us illustrate the procedure by particular examples.
(I). Abstraction of H atoms from H-sites by OH radicals:
Partial production rate of alkyl radicals (equal to the decay rate of H-sites) in reaction (26) is
expressed as
Qprod(alkyl rad) = Qloss(H-sites) = JOH NH /K, (32)
where NH is the surface concentration of H-sites, K is the total surface density of H-sites on a virgin
polymer surface, is the reaction probability per unit area and JOH is the flux of OH radicals to the
polymer surface. The flux of OH radicals is estimated as
JOH = nOHOH/4, (33)
where nOHis the concentration of OH radicals in plasma near the surface and vOH is the thermal
velocity of OH radicals.
(II) Abstraction of H atoms from H-sites by alkoxy radicals:
Alkoxy radical(surface) + H-site(surface) = Alcohol group (surface) + Alkyl radical (surface). (34)
Partial production rates of alcohol groups and alkyl radicals (and the decay rates of H-sites and
alkoxy radicals) for this process are calculated as
Qprod(alcohol)=Qprod(alkyl rad)=Qloss(alkoxy rad)=Qloss(H-sites) = Nalkoxy kNH , (35)
where Nalkoxy is the surface concentration of alkoxy radicals and k is the rate constant of reaction
(34).
(III) Chain backbone scission due to interaction of alkoxy radicals with polymer backbone:
Partial production rates of aldehydes and backbone scission radicals (and decay rate of alkoxy
radicals) for this process are calculated as
Qprod (aldehyde)= Qprod (scission)= Qloss(alkoxy rad)=NAlkoxy -1, (37)
a b
The abstraction of H atoms from H-sites leads to the formation of “in chain” alkyl radicals,
surface concentrations of which get maximum (~ 1011 cm-2) at times about 10-3 s (Figure 10.17b). At
later times these radicals are consumed by the reactions with O2 and O3 to form peroxy and alcoxy
radicals. As the free sites 2PP and 3PP on the PP surface are depleted, the densities of the alkyl
radicals decrease. The maximum surface density of the “end free” alkyl radicals (appeared due to
the bond scission processes) is about ~ 1010 cm-2, these radicals are also consumed by the reactions
with O2 and O3 to form “end free” peroxy and alcoxy radicals. After the end of treatment, the main
source of alkyl radical production is diminished (the abstraction of H atoms by OH radicals and
formation of “in chain” peroxy radicals, which are responsible for the bond scission processes) and
surface concentration of these radicals is decreased. At later times “in chain” alkyl radicals are
formed due to the abstraction of H atoms by alkoxy and peroxy radicals stored during treatment.
“End free” alkyl radicals are also formed, since there is some amount of “in chain” alkoxy radicals,
which produce bond scissions.
Surface concentrations of alkoxy and peroxy radicals (see Figure 10.18a) are not very high (in
total ~3. 104 cm-2 at t = 3s). Under discharge conditions the decay rates of these radicals in reactions
with OH and HO2 plasma radicals are rather high. After the treatment the decay is provided by
recombination reactions. Concentrations of aldehydes, acids and carbonyl radicals are small and
concentration of ketones is about ~ 3.1014 cm-2 (see Figure 10.18b).
a b
Figure 10.18a–b Calculated surface concentrations: a of alkoxy and peroxy radicals as functions
of time; b of different groups and radicals with double bonded (=O) oxygen atoms as functions of
time. Treatment time is 3 s. t
It can be seen from Figure 10.19a that the major amount of O atoms is introduced onto the PP
surface in the form of hydroperoxides and alcohols, the concentration of “in chain” groups is higher
than the concentration of “end free” groups. The total concentration of the products of
recombination (see Figure 10.19b) is about 2.3 1014 cm-2. ROOPP and ROPP groups (in total ~ 1.2
1014 cm-2 ) as well as some part of PPOOPP and PPOPP groups are the cross links. Let us note that
the concentration of cross linked “end free” alkyl radicals is very small and is not shown in the
figures.
a b
Figure 10.19a–b Calculated surface concentrations: a of alcohols and hydroperoxides as functions
of time; b of products of alkoxy and peroxy radicals recombination as functions of time. Treatment
time is 3 s.
The total concentration of O atoms incorporated onto PP surface is 3. 1015 cm-2, the
concentration of “in chain” O atoms is 1.6 times higher then the concentration of “end free” atoms
(see Figure 10.20a).
a b
According to our calculations (see Figure 10.20b) at t = 3 s the number of C atoms etched from
1 cm2 is about 2.5 1014, i.e. about 13% of the upper PP layer is etched. Besides, there appeared a
large number of bond scissions. From the standpoint of experiments it means that the upper layer of
PP polymer contains a lot of low molecular weight moieties. In fact, such a situation responds to
over-treatment, since these moieties can be easily removed from the surface, for example, by a
mechanical means. In general, the treatment time should be long enough to provide necessary
degree of oxidation but it is restricted by noticeable destruction of the upper layer of polymer. It
follows from our studies that under considered conditions acceptable treatment time is about 1 s.
Now let us compare results of calculations with available experimental data [70]. It follows from
Figure 10.20a that the characteristic time for the surface concentration of O atoms introduced into
PP surface is about 12 s, this value is in a reasonable agreement with that estimated from the
results of contact angle measurements depending on treatment time [70].
We can also compare calculated and measured O/C ratios. According to the XPS analysis under
experimental conditions [70], O/C ratio (at t = 3 s) is about 0.25. The characteristic depth where
from the signal was collected was about L0 ~7.5 nm, this depth corresponds to 15 PP atomic layers.
It is possible to estimate the value of O/C ratio, which is found from XPS analyses, provided
that concentration of O atoms introduced in the surface of PP polymer is known [70]. To do this, we
have assumed that XPS signal intensity from C atoms located at different depths exponentially
decreases with depth with a characteristic length . Then the signal from i-th layer (i = 0, 1, 2, …; i
= 0 denotes the upper layer) of C atoms can be calculated as
SCi = kXkC[C1]exp(-i/), (38)
where [C1] =2. 1015 cm-2 is the surface density of C atoms in a layer, is the thickness of PP
monolayer (0.5 nm), kX is a numerical factor proportional to the power of the X-ray source and kC is
a numerical factor proportional to the probability of the electron emission from C atoms.
The total signal from C atoms is calculated as
. (39)
In our model O atoms are introduced only in the upper layer of PP polymer. For this reason, the
XPS signal intensity from O atoms can be estimated as
SO = kXkO[O], (40)
where [O] is the surface concentration of O atoms and kO is a numerical factor proportional to the
probability of the electron emission from O atoms.
The O/C ratio measured in experiments is the ratio of signals from O and C atoms
normalized to corresponding probabilities of the electron emission. Respectively, O/C ratio is
calculated as
(41)
To estimate the value of let us note that in experiments the depth of analysis was about L0=7.5
nm [66], i.e. signal was collected from 15 PP atomic layers. The contribution from deeper layers is
neglected. Therefore it is reasonably to assume that = L0/3 = 2.5 nm, since in this case 15 PP
atomic layers provide about 95% of the total signal calculated from equation (39).
For given values of and (and taking into account only 15 PP atomic layers) equation (41)
can be rewritten as
, (42)
REFERENCES
1. Kunhardt, E. E. (2000) Generation of Large-Volume, Atmospheric-Pressure, Nonequilibrium
Plasmas. IEEE Transactions on Plasma Science, 28 (1), 189-200.
2. Chang, J.-S., Lawless, P. A. and Yamamoto, T. (1991) Corona discharge processes. IEEE Trans.
Plasma Science, 19 (6), 1152-1166.
3. Napartovich, A. (2001) Overview of atmospheric pressure discharges producing non- thermal
plasma. Plasmas and Polymers, 6 (1), 1-14.
4. Becker, K., Barker,R., Kogelschatz, U. and Schoenbach, K.(eds) (2004) Non-Equilibrium Air
Plasmas at Atmospheric Pressure, IOP Publ., Bristol.
5. Conrads, H. and Schmidt, M. (2000) Plasma generation and plasma sources. Plasma Sources Sci.
Technol., 9 (4), 441–454.
6. Kogelschatz, U. (2002) Industrial innovation based on fundamental physics. Plasma Sources Sci.
Technol., 11 (3A), A1–A6.
7. Fridman, A., Chirokov, A. and Gutsol, A. (2005) Non-thermal atmospheric pressure
discharges. J. Phys. D: Appl. Phys., 38 (2), R1–R24.
8. Akishev, Yu. S., Grushin, M. E., Napartovich, A. P. and Trushkin, N. I. (2002) Novel AC and
DC Non-Thermal Plasma Sources for Cold Surface Treatment of Polymer Films and Fabrics at
Atmospheric Pressure. Plasmas and Polymers, 7 (3), 261-289.
9. Akishev, Yu. S., Aponin, G. I., Grushin, M. E., Karal’nik, V. B., Pan’kin, M. V., Petryakov, A.
V. and Trushkin, N. I., (2008) Alternating Nonsteady Gas-Discharge Modes in an Atmospheric-
Pressure Air Flow Blown through a Point-Plane Gap. Plasma Physics Reports, 34 (4), 312–324.
10. Akishev, Yu. S., Deryugin, A. A., Elkin, N. N., Kochetov, I. V., Napartovich, A. P., and
Trushkin, N. I. (1994) Calculation of Air Glow Discharge Spatial Structure. Plasma Physics
Reports, 20 (5), 437-441.
11. Akishev, Yu. S., Deryugin, A. A., Karal’nik, V. B., Kochetov, I. V., Napartovich, A. P. and
Trushkin, N. I. (1994) Numerical Simulation and Experimental Study of a Atmospheric-Pressure
Direct-Current Glow Discharge. Plasma Physics Reports, 20 (6), 511-524.
12. Akishev, Yu. S., Deryugin, A. A., Kochetov, I. V., Napartovich, A. P. and Trushkin, N. I.
(1994) Generation Efficiency of Chemically -Active Particles in Self-Maintained Discharge.
Plasma Physics Report, 20 (6), 525-532.
13. Napartovich, A. P., Akishev, Yu. S., Deryugin, A. A., Kochetov, I. V. and Trushkin, N. I.
(1993) Glow Discharge with fast Gas Flow for Flue Gas Processing, in Non-Thermal Plasma
Techniques for Pollution Control, (eds B. M. Penetrante and S. E. Schultheis), Springer-Verlag,
NATO ASI Series G 34, Part B, pp. 355-370.
14. Akishev, Yu. S., Deryugin, A. A., Kochetov, I. V., Napartovich, A. P. and Trushkin, N. I.
(1993) DC glow discharge in air flow at atmospheric pressure in connection with waste gases
treatment. J. Phys. D: Appl. Phys., 26 (10), 1630-1637.
15. Stefanović, I., Bibinov, N. K., Deryugin, A. A., Vinogradov, I. P., Napartovich, A. P. and
Wiesemann, K. (2001) Kinetics of ozone and nitric oxides in dielectric barrier discharges in O2/NOx
and N2/O2/NOx mixtures. Plasma Sources Sci. Technol., 10 (3), 406-416.
16. Gibalov, V. I. and Pietsch, G. J. (2000) The development of dielectric barrier discharges in gas
gaps and on surfaces. J. Phys. D: Appl. Phys., 33 (20), 2618-2636.
17. Eliasson, B. and Kogelschatz, U. (1991) Modeling and applications of silent discharge plasmas.
IEEE Trans. Plasma Sci., 19 (2), 309-323.
18. Steinle, G., Neundorf, D., Hiller, W. and Petralla, M. (1999) Two-dimensional simulation of
filaments in barrier discharges. J. Phys. D: Appl. Phys., 32 (12), 1350-1356.
19. Babaeva, N. Yu. and Naidis, G. V. (2000) Modeling of streamer propagation, in Electrical
Discharges for Environmental Purposes: Fundamentals and Applications, (ed E. M. van
Veldhuizen), Nova Science Publishers, Inc., New York, pp. 21-48.
20. Kulikovsky, A. A. (1994) The structure of streamers in N2. I. fast method of space-charge
dominated plasma simulation. J. Phys. D: Appl. Phys., 27 (12), 2556-2563.
21. Kulikovsky, A. A. (1994) The structure of streamers in N2. II. Two- dimensional simulation. J.
Phys. D: Appl. Phys., 27 (12), 2564-2569.
22. Kulikovsky, A. A. (1997) Positive streamer between parallel plate electrodes in atmospheric
pressure air. J. Phys. D: Appl. Phys., 30 (3), 441-450.
23. Kulikovsky, A. A. (1997) The mechanism of positive streamer acceleration and expansion in air
in a strong external field. J. Phys. D: Appl. Phys., 30 (10), 1515-1522.
24. Pancheshnyi, S. V., Starikovskaya, S. M. and Starikovskii, A. Yu. (2001) Role of
photoionization processes in propagation of cathode-directed streamer. J. Phys. D: Appl. Phys., 34
(1), 105-115.
25. Kushner, M. J. (2005) Modelling of microdischarge devices: plasma and gas dynamics. J.
Phys. D: Appl. Phys., 38 (11), 1633-1643.
26. Trichel, G. W. (1938) The mechanism of the negative Point to Plane Corona near Onset. Phys.
Rev., 54 (12), 1078-1084.
27. Akishev, Yu. S., Kochetov, I. V., Loboiko, A. I. and Napartovich, A. P. (2002) Numerical
Simulations of Trichel Pulses in a Negative Corona in Air. Plasma Physics Reports, 28 (12), 1049-
1059.
28. Napartovich, A. P., Akishev, Yu. S., Deryugin, A. A., Kochetov, I. V., Pan’kin, M. V. and
Trushkin, N. I. (1997) A numerical simulation of Trichel-pulse formation in a negative corona. J.
Phys. D: Appl. Phys., 30 (19), 2726-2736.
29. Akishev, Yu. S., Grushin, M. E., Kochetov, I. V., Napartovich, A. P. and Trushkin, N I. (1999)
An Establishment of Regular Trichel Pulses in a Negative Corona in Air. Plasma Physics Reports,
25 (11), 922-927.
30. Akishev, Yu. S, Grushin, M. E, Deryugin, A. A, Napartovich, A. P, Pan’kin, M. V. and
Trushkin, N. I. (1999) Self-oscillations of a positive corona in nitrogen. J. Phys. D: Appl. Phys. 32
(18), 2399-2409.
31. Akishev, Yu. S., Grushin, M. E., Kochetov, I. V., Napartovich, A. P., Pan’kin, M. V. and
Trushkin, N. I. (2000) Transition of a Multipin Negative Corona in Atmospheric Air to a Glow
Discharge. Plasma Physics Reports, 26 (2), 157-163.
32. Itikava, Y., Hayashi, M., Ichimura, A., Onda, K., Sakimoto, K., Takanayagi, K., Nakamura, M.,
Nishimura, H. and Takanayanagim, T. (1986) Cross Sections for Collisions of Electrons and
Photons with Nitrogen Molecules. Journal of Physical and Chemical Reference Data, 15 (3), 985-
1010.
33. Phelps, A. V. and Pitchford, L. C. (1985), 26 th report. JILA Information Center Report,
Boulder.
34. Pack, J. L., Voshall, R. E., and Phelps, A. V. 1962, Drift Velocities of Slow Electrons in
Krypton, Xenon, Deuterium, Carbon Monoxide, Carbon Dioxide, Water Vapor, Nitrous Oxide, and
Ammonia. Phys. Rev., 127 (6), 2084-2089.
35. Eliasson, B. and Kogelschatz, U. (1986) Basic Data for Modelling of Electric Discharge in
Gases: Oxygen. Asea Brown Boweri Forschungszntrum CH-5405, Baden, KLR 86-11C.
36. Rapp, D. and Englander-Golden, P. (1965) Total cross sections for ionization and attachment in
gases by electron impact. I. Positive ionization. J. Chem. Phys., 43 (12), 1464-1479.
37. Yousfi, M., Azzi, N., Segur, P., Gallimberti I. and Stangherlin I. (1987) Electron-molecule
collision cross sections and electron swarm parameters in some atmospheric gases (N 2, O2, CO2 and
H2O), Centre de Physique Atomique de Toulouse & Istituto di Elettrotecnica ed Elettronical
Universita di Padova, Toulouse Padova.
38. Ryzko, H. (1966) Ionization, attachment and drift velocity of electrons in water vapor and dry
air. Arkiv foer Fysik, 32 (1), 1-18.
39. Prasad, A. N. and Craggs, J. D. (1960) Measurement of Ionization and Attachment Coefficients
in Humid Air in Uniform Fields and the Mechanism of Breakdown. Proc. Phys. Soc. London, 76
(2), 223-232.
40. Risbud, A. V. and Naidu, M. S. (1979) Ionization and attachment in water-vapor and ammonia.
Journal de Physique, 40 (7), 77-78.
41. Crompton, R. W., Rees, J. A. and Jory, R. L. (1965) The Diffusion and Attachment of Electrons
in Water Vapour. Aust. J. Phys., 18 (6), 541-551.
42. Parr, J. E. and Moruzzi, J. L. (1972) Electron attachment in water vapour and ammonia. J. Phys.
D: Appl. Phys., 5 (3), 514-524.
43. Chanin, L. M., Phelps, A. V. and Biondi, M. A. (1962) Measurements of the Attachment of
Low-Energy Electrons to Oxygen Molecules. Phys. Rev., 128 (1), 219–230.
44. Rees, J. A. (1965) Behavior of free and attached electrons in oxygen. Aust. J. Phys., 18 (1), 41-
57.
45. Huxley, L. G. H., Crompton, R. W. and Bagot, C. H. (1959) A New Method for Measuring the
Attachment of Slow Electrons in Gases. Australian J. Phys., 12 (3), 303-308.
46. Chatterton, P. A. and Craggs, J. D. (1961) J. Electron. Control, 11, 425-437.
47. Doehring, A. (1952) Measurement of the probability of addition of electrons to oxygen by a
time-of-transit method. Zeitschrift fuer Naturforschung, 7A, 253-270.
48. Kossyi, I. A., Kostinskii, A. Y., Matveev, A. A. and Silakov, V. P. (1992) Kinetic scheme of the
non-equilibrium discharge in nitrogen-oxygen mixtures. Plasma Sources Sci. Techn., 1 (3), 207-
220.
49. Capitelli, M., Ferreira, C. M., Gordiets, B. F. and Osipov A. I. (2000) Plasma kinetics in
atmospheric gases, Springer-Verlag, Berlin.
50. Ionin, A. A., Kochetov, I. V., Napartovich, A. P. and Yuryshev, N. N. (2007) Physics and
engineering of singlet delta oxygen production in low-temperature plasma. J. Phys. D: Appl. Phys.,
40 (2), R25-R61.
51. Maetzing, H. (1991) Chemical Kinetics of Flue Gas Cleaning by Irradiation with Electrons, in
Adv. in Chemical Phys., 80, (eds I. Prigogine and S.A. Rice), John Wiley& Sons, pp.315-402.
52. Zakharov, A. I., Klopovskii, K. S., Osipov, A. P., Popov, A. M., Popovicheva, O. B.,
Rakhimova, T. V., Samorodov, V. A. and Sokolov, A. P. (1988) Kinetics of Processes Excited by a
Self-Sustaining Volume Discharge in Oxygen. Plasma Physics Reports, 14 (3), 191-195.
53. Mukkavilli, S., Lee, C.K., Varghese, K. and Tavlarides, L.L. (1988) Modeling of the
electrostatic corona discharge reactor. IEEE Trans. Plasma Sci., 16 (6), 652-660.
54. Mc Ewan, M. J. and Phillips, L. F. (1975) Chemistry of the Atmosphere, Edward Arnold Ltd.,
London.
55. Atkinson,R, Baulch, D. L., Cox, R.A., Hampson, R.F., Kerr, J.A. and Troe, J. (1989) Evaluated
kinetic and photochemical data for atmospheric chemistry: Supplement III - IUPAC Subcommittee
on Gas Kinetic Data Evaluation for Atmospheric Chemistry. Journal of Physical and Chemical
Reference Data, 18 (2), pp.881-1097.
56. Person, J.C. and Ham, D.O. (1988) Removal of SO2 and NOx from stack gases by electron beam
irradiation. Radiat. Phys. Chem., 31 (1-3), 1-8.
57. Feoktistov, V. A., Lopaev, D. V., Klopovsky, K. S., Popov, A. M., Popovicheva, O. B.,
Rakhimov, A. T. and Rakhimova, T. V. (1993) Low pressure RF discharge in electronegative gases
for plasma processing. J. Nucl. Materials, 200 (3), p. 309-314.
58. Fraser, M.E. and Piper, L.G. (1989) Product branching ratios from the N2(A3Σu+) + O2
interaction. J. Phys. Chem., 93 (3), p.1107-1111.
59. Slovetskii, D. I. (1980) Mechanisms of chemical reactions in non-equilibrium plasma, Nauka,
Moscow.
60. Gentile, A. C. and Kushner, M. J. (1995) Reaction chemistry and optimization of plasma
remediation of NxOy from gas streams. J. Appl. Phys., 78 (3), 2074-2085.
61. De Geyter, N., Morent, R., Leys, C., Gengembre, L. and Payen, E. (2007) Treatment of polymer
films with a dielectric barrier discharge in air, helium and argon at medium pressure. Surface &
Coatings Technology, 201 (16-17), 7066-7075.
62. Hubenák, J. and Krcma, F. (2000) Determination of a hydrocarbon concentration in the N2 dc
flowing afterglow and its application. J. Phys. D: Appl. Phys., 33 (23), 3121-3128.
63. Pintassilgo, C. D., Cernogora, G. and Loureiro, J. (2001) Spectroscopy study and modelling of
an afterglow created by a low-pressure pulsed discharge in N2-CH4. Plasma Sources Sci. Technol.,
10 (2), 147-161.
64. Dilecce, G., Simek, M. and De Benedictis, S. (2001) The N2(A3Σu+) energy transfer to OH(A2Σ+)
in low-pressure pulsed RF discharges. J. Phys. D: Appl. Phys., 34 (12), 1799-1806.
65. Fresnet, F., Baravian, G., Magne, L., Pasquiers, S., Postel, C., Puech, V. and Rousseau, A.
(2002) Influence of water on NO removal by pulsed discharge in N2/H2O/NO mixtures. Plasma
Sources Sci. Technol., 11 (2), 152-160.
66. Dorai, R. and Kushner, M. J. (2003) A model for plasma modification of polypropylene using
atmospheric pressure discharges. J. Phys. D: Appl. Phys., 36 (6), 666–685.
67. Dorai, R. and Kushner, M. J. http://www.ee.ualberta.ca/icops2002 (30 January 2009).
68. Bhoj, A. N. and Kushner, M. J. (2007) Continuous processing of polymers in repetitively pulsed
atmospheric pressure discharges with moving surfaces and gas flow. J. Phys. D: Appl. Phys., 40
(22), 6953-6968.
69. Rabek, J. F. (1995) Polymer Photodegradation: Mechanisms and Experimental Methods, 1st
edn, Chapman and Hall, London.
70. Akishev, Yu., Grushin, M., Dyatko, N., Kochetov, I., Napartovich, A.,
Trushkin, N., Tran, Minh Duc and Descours, S. (2008) Studies on cold plasma-polymer
surface interaction by example of PP- and PET-films. J. Phys. D: Appl. Phys., 41 (23), 1-13.
71. ANSI 17-2Q98. (1998) Standard Reference Database, American National Standards Institute,
New York. http://kinetics.nist.gov/kinetics/ (9 February 2009).