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LIGA

LIGA is a technology for fabricating high-resolution MEMS devices using deep X-ray lithography, electrodeposition, and replication processes. It requires significant infrastructure, including synchrotron radiation sources and cleanrooms, along with highly trained staff. Nanofabrication techniques, including top-down and bottom-up approaches, are employed to create devices at the nanoscale, while Solid Freeform Fabrication (SFF) refers to various additive manufacturing methods.

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8 views24 pages

LIGA

LIGA is a technology for fabricating high-resolution MEMS devices using deep X-ray lithography, electrodeposition, and replication processes. It requires significant infrastructure, including synchrotron radiation sources and cleanrooms, along with highly trained staff. Nanofabrication techniques, including top-down and bottom-up approaches, are employed to create devices at the nanoscale, while Solid Freeform Fabrication (SFF) refers to various additive manufacturing methods.

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durgacharya135
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© © All Rights Reserved
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LIGA,

Nano-fabrication
and
Solid Freeform fabrication

2024
LIGA
• The name “LIGA” – German acronym for Lithographie (LI),
Galvanoformung (G), and Abformung (A).
• In English the term refers to lithography (although by synchrotron
radiaCon), electrodeposiCon (to create micromolds), and replicaCon
(through molding plasCc parts).
• LIGA is a technology for fabricaCng high resoluCon and high aspect
raCo MEMS devices and components.
• The core process in LIGA is deep X-ray lithography at a synchrotron
radiaCon source.
• LIGA – originally used for fabricaCng uranium separaCon nozzles.
Uranium separation nozzle
LIGA Infrastructure
• Professional LIGA work requires a significant infrastructure.
• Need a synchrotron radia=on source and its beamline sta=ons.
• Also require cleanrooms and equipment, suppor=ng laboratories,
mask making capabili=es, and prototype lines for replica=on.
• Highly qualified and well-trained staff for opera=ng these facili=es
are mandatory.
Synchrotron Radiation System

G. Hans H. n, S. Volker and L. Jürg (2015)

h<ps://www.google.com/url?sa=i&url=h<ps%3A%2F%2Fwww.radio2space.com
ANKA (Ångströmquelle Karlsruhe) Lab

G. Hans H. n, S. Volker and L. Jürg (2015)


LIGA Process
• First step – the pa,ern on an X-ray mask is transferred to a resist
material by means of X-ray lithography.
• The X-ray mask is essen;ally composed of microstructures made of
an X-ray absorbing material on a highly X-ray transparent substrate.
• X-ray absorbing materials – e.g., nickel, lead, gold, pla;num.
• The substrate consists of a copper block, onto which solid block of
X-ray resist with a thickness between approx. 100 μm and 2 mm is
bonded.
X-Ray Exposure and development
Hard X-ray
X-ray Mask

X-ray resist (PMMA)


Resist pattern
Copper substrate

Hard (0.2–1 nm) X-ray exposure Developed resist structure


G. Hans H. n, S. Volker and L. Jürg (2015)
X-Ray Exposure

Photoresist

Metal
X-Ray Exposure
Mold Insert Fabrication
• A"er concluding the lithography step, there are two processes le"
un6l the LIGA produc6on can start:
1. using the resist pa=ern for fabrica6ng a mold insert and
2. using the mold insert for replica6on, for instance by hot
embossing.
• The mold insert is made by electrodeposi6on.
• The mold material used in most cases is nickel.

• The main advantage of LIGA is its capability of fabrica6ng


microparts with a substan6al aspect ra6o and smooth sidewalls.
Mold insert fabrication and application

Mold insert

Resist pattern
Hot embossed or molded part
Mold insert fabrica0on by electrodeposi0on Mold insert applica0on
G. Hans H. n, S. Volker and L. Jürg (2015)
LIGA Processes

Prime Faraday Technology Watch (2006)


Microspectrometer for UV and visible light

G. Hans H. n, S. Volker and L. Jürg (2015)


Nanofabrication
• Nanotechnology is the fabrica2on and applica2on of devices with
dimensions below 100 nm in at least one direc2on.
• Such devices are called nanoelectromechanical systems or NEMS
• Nanostructures provide an interes2ng tool for studying the
electrical, magne2c, op2cal, thermal, and mechanical proper2es of
ma@er at the nanometer scale.
• Nanostructures can provide significant improvements in the perfor-
mance of electronic/op2cal devices and sensors.
• Op2cal sources and detectors having nm-size dimensions exhibit
improved characteris2cs not achievable in larger devices
Nanofabrica*on
• Uses two radically different approaches:
• top–down processes and
• bo6om–up processes.
• Top–down nanofabrica<on is similar to microfabrica<on, building
pa6erned layers above each other.
• Bo6om–up nanofabrica<on uses molecular self-assembly, with
molecules autonomously “growing” into nanostructures.
Nanofabrica*on
• Top–down nanofabrication is similar to microfabrication, building
patterned layers above each other.
• This approach starts with a bulk or thin-film material and removes
selective regions to fabricate nanostructures (similar to
micromachining techniques)
• The top-down approach is an off-shoot of standard lithography and
micromachining techniques.
Nanofabrica*on
• Bo#om–up nanofabrica0on uses molecular self-assembly, with
molecules autonomously “growing” into nanostructures.
• This method relies on molecular recogni;on and self-assembly to
fabricate nanostructures out of smaller building blocks (molecules,
colloids, and clusters).
• the bo?om-up approach has a more chemical engineering and
material science flavor and relies on fundamentally different
principles.
E-Beam Nanofabrication
• E-beam lithography is an alterna3ve and a6rac3ve technique for
fabrica3ng nanostructures
• It uses an electron beam to expose an electron-sensi3ve resist such
as poly(methyl methacrylate) (PMMA) dissolved in trichlorobenzene
(posi3ve) or polychloromethylstyrene (nega3ve).
• E-beam lithography in conjunc3on with processes such as etching,
electrodeposi3on, etc. can be used to fabricate various
nanostructures.
Nanofabrica*on
Other nanofabrica.on processes:
• Epitaxy and strain engineering - molecular-beam epitaxy (MBE) and
metalorganic chemical vapor deposi.on (MOCVD) for fabrica.ng
quantum well lasers, photodetector, resonant tunneling diodes, etc.
• Scanning-probe techniques - Nanometer-scale local oxida.on of
various materials. The most common applica.on of this principle is
the oxida.on of hydrogen-passivated silicon
• Self-assembly and template manufacturing
Nanofabrica*on
Other nanofabrication processes:
• Self-assembly involves aggregation of colloidal nanoparticles into
the final desired structure.
• The central theme behind the self-assembly process is spontaneous
(physical) or chemical aggregation of colloidal nanoparticles
Nanofabrica*on
Other nanofabrica.on processes:
• Template manufacturing - to fabricate 3-D organic or inorganic
structures from a nanotemplate
• Self-assembly is the preferred technique to produce large-area
nanotemplates.
Solid Freeform Fabrication (SFF)
• Another term used for addi0ve manufacturing, or AM technology.
• Also called Freeform Fabrica0on.
Other terms used are:
• Automated Fabrica0on (Autofab)
• Addi0ve Manufacturing or Layer-Based Manufacturing
• Stereolithography or 3D Prin0ng
• Rapid Prototyping

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