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Prof. Chandra PDF

This document outlines 5 proposed M.Tech projects for the 2013-2014 year, including supervisors and short descriptions. Project 1 involves continuing development of a dc MEMS switch. Project 2 focuses on designing and fabricating a Film Bulk Acoustic Resonator using dry etching for microwave frequencies. Project 3 involves designing MEMS elements for tuning using dry etching. Project 4 is to design and fabricate test structures to extract parameters of semiconductor materials, processes and devices. Project 5 is to design and fabricate a piezoresistive pressure sensor using dry etching.

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Archana Tripathi
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0% found this document useful (0 votes)
34 views1 page

Prof. Chandra PDF

This document outlines 5 proposed M.Tech projects for the 2013-2014 year, including supervisors and short descriptions. Project 1 involves continuing development of a dc MEMS switch. Project 2 focuses on designing and fabricating a Film Bulk Acoustic Resonator using dry etching for microwave frequencies. Project 3 involves designing MEMS elements for tuning using dry etching. Project 4 is to design and fabricate test structures to extract parameters of semiconductor materials, processes and devices. Project 5 is to design and fabricate a piezoresistive pressure sensor using dry etching.

Uploaded by

Archana Tripathi
Copyright
© Attribution Non-Commercial (BY-NC)
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
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Proposed Projects for M.Tech.

RFDT (2013-2014)
S. No. 1 Broad Project Title / Area Supervisor (s) Short description This will be in continuation of the previous project, which was started but not completed yet.

Design and Prof. development of Sudhir a dc MEMS Chandra switch


Development of Film Bulk Acoustic Resonator (FBAR) by Dry Etching Process for Microwave Frequencies Realization of elements for tuning in MEMS technology Design and development of Test Structures for Extraction of Parameters of Semiconductor Material, Processes and Devices

Prof. The FBAR based on piezoelectric Sudhir zinc oxide and MEMS technology Chandra using dry etching process. The and Prof. S work involves design, simulation, K Koul mask design and mask fabrication, device fabrication and testing in Microwave frequency range. Prof. Sudhir Chandra and Prof. S K Koul Prof. Sudhir Chandra The scope of the project is to design and fabricate test structures in IC chips to extract parameters related to material, devices and processing. The examples are (but not limited to): life time, mobility, carrier concentration, contact resistance of metallization, sheet resistance, surface recombination velocity etc.

Design and fabrication of piezoresistive pressure sensor using dry etching process A self aligned MOSFET using sputter deposited dielectric and polysilicon film

Prof. Sudhir Chandra

Prof. Sudhir Chandra

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