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Micro Nano Experimental Datas

This 10-page document provides laser processing data for femtosecond and nanosecond lasers on silicon samples. It includes optical microscope and SEM images showing processing results at different laser parameters. There are two minor corrections noted to an instruction document. Processing was done with Gaussian focused beams of 55um for nanosecond and 70um for femtosecond lasers. Results are shown for both high and low fluence processing with each laser. KOH etching images of some nanosecond processed samples are also included.

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62 views10 pages

Micro Nano Experimental Datas

This 10-page document provides laser processing data for femtosecond and nanosecond lasers on silicon samples. It includes optical microscope and SEM images showing processing results at different laser parameters. There are two minor corrections noted to an instruction document. Processing was done with Gaussian focused beams of 55um for nanosecond and 70um for femtosecond lasers. Results are shown for both high and low fluence processing with each laser. KOH etching images of some nanosecond processed samples are also included.

Uploaded by

summersz
Copyright
© Attribution Non-Commercial (BY-NC)
We take content rights seriously. If you suspect this is your content, claim it here.
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Download as DOC, PDF, TXT or read online on Scribd
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Total 10 pages.

Laser power data for femtosecond and nanosecond lasers are


provided as separate files. Please notes two minor corrections to the lab instruction
document:
(1) Neutral density filter (0,0) should be Neutral density filter (1,1)
(2) UoM letters are now laser marked at a low and a high fluence on separate
workpiece for comparision. (initially both high and low fluence experiments
was carried out on same piece of sample, but was found debris generated by
high fluence processing contaminant low fluence sample). All data shown
below are results from seperates Silicon samper for high and low fluences.

Gaussian focus for both lasers, 55 um spot size for nanosecond laser and
70 um spot size for fs laser.

1. Nanosecond laser processing of Silicon


1.1 Processed at high fluence:

Fig.1 Nanosecond laser , high fluence, OM image.

1
Fig. 2 Nanosecond laser , high fluence, SEM image

Fig.3 Nanosecond laser , high fluence, SEM image, zoomed view

1.2) processed at a low fluence:

2
Fig. 4 Nanosecond laser , low fluence, OM image. Not visible under OM, but slightly
visible under SEM, see Fig. 5

Fig. 5 Nanosecond laser , low fluence, SEM image.

3
Fig. 6 Nanosecond laser , low fluence, SEM image, zoomed view of Fig. 5 .

2. Femtosecond laser results


2.1) Low fluences

4
Fig. 7 Fs laser, low fluence, OM image

Fig. 8 Fs laser, low fluence, SEM image

5
A

Fig. 9 Fs laser, low fluence, SEM image, zoomed view of above figure position A

Fig. 10 Fs laser, low fluence, SEM image, zoomed view of above figure position B

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2.2) High fluences

Fig. 11 Fs laser, high fluence, OM image

Fig. 12 Fs laser, high fluence, SEM image

7
A

Fig. 13 Fs laser, high fluence, SEM image, zoomed view of above figure position A

Fig. 14 Fs laser, high fluence, SEM image, zoomed view of above figure position B

8
KOH etching of nanosecond laser processed
sample:

Fig. 15 KOH etched sample of Fig.6 sample (check above)

Fig. 16 KOH etched sample of Fig.6 sample , zoomed view of Fig. 15

9
Fig. 17 KOH etched sample of Fig. 2 (check above) (Sample was brokened because of
uncareful manual handling during experiments, and is not effect of laser processing).

Fig. 18. Zoomed view of Fig. 17, compare with Fig. 3 please.

--END--

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