0% found this document useful (0 votes)
36 views1 page

Btech Ec 6 Sem Integrated Circuit Technology Jun 2017

This document contains an exam for a theory course in integrated circuit technology. It includes three sections with multiple choice and long answer questions. Section A contains 10 multiple choice questions about topics like the uses of silicon dioxide, different types of defects, preoxidation cleaning, epitaxy, ion implantation, diffusion equations, stopping power, performance of projection printers, and ion sources. Section B contains 5 long answer questions about electronic grade silicon, cleaning silicon wafers, silicon on insulator, plasma oxidation, effects of impurities on oxidation, lithography, and implantation equipment. Section C contains 2 long answer questions each about wafer shaping, molecular beam epitaxy, vacuum deposition, and the oxidation layer.

Uploaded by

Abhay Tomar
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
0% found this document useful (0 votes)
36 views1 page

Btech Ec 6 Sem Integrated Circuit Technology Jun 2017

This document contains an exam for a theory course in integrated circuit technology. It includes three sections with multiple choice and long answer questions. Section A contains 10 multiple choice questions about topics like the uses of silicon dioxide, different types of defects, preoxidation cleaning, epitaxy, ion implantation, diffusion equations, stopping power, performance of projection printers, and ion sources. Section B contains 5 long answer questions about electronic grade silicon, cleaning silicon wafers, silicon on insulator, plasma oxidation, effects of impurities on oxidation, lithography, and implantation equipment. Section C contains 2 long answer questions each about wafer shaping, molecular beam epitaxy, vacuum deposition, and the oxidation layer.

Uploaded by

Abhay Tomar
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
You are on page 1/ 1

www.aktuonline.

com
Printed Pages : 1 Roll No. NEC603
B. TECH.
THEORY EXAMINATION (SEM–VI) 2016-17
INTEGRATED CIRCUIT TECHNOLOGY
Time : 3 Hours Max. Marks : 100
Note : Be precise in your answer. In case of numerical problem assume data wherever not provided.

SECTION – A
1. Attempt all of the following questions: 10 x 2 = 20
(a) What are the used of Silicon Dioxide?
(b) Differentiate among Point, Franke and Schottdy Defects.
(c) What is preoxidation cleaning?
(d) What is Epitaxy?
(e) What do you understand by Ion – implantation?
(f) Write the diffusion equation at any given distance and time.
(g) Define the total stopping power of the target.
(h) What are the four important performance of a projection printer?
(i) Write the principle of mass separation.
(j) What does ion source contain?

SECTION – B
www.aktuonline.com

2 Attempt any five of the following questions: 5 x 10 = 50


a) Explain Electronic Grade Silicon with neat diagram. Explain the polishing process of
Silicon in detail.
b) Why is cleaning of Silicon wafer necessary before any processing steps? Explain the
crystal structure.
c) Describe the Silicon on insulator with neat diagram. Discuss about the epitaxial defects.
d) Explain plasma oxidation technique for the growth of oxide layer. Explain the
application of SiO2 layer in IC Fabrication.
e) Describe the effect of impurities and damage on the oxidation rate.
f) Explain Lithography with neat schematic diagram.
g) Describe basic layout of implantation equipment.
h) Discuss gaseous and liquid diffusion systems.

SECTION – C
Attempt any two of the following questions: 2 x 15 = 30
3 (a) Discuss different shaping operations involved in Preparing Wafers with diagram.
(b) Explain the principle of molecular beam epitaxy.
4 (a) Explain the concept of vacuum Deposition.
(b) Describe the various charges present in oxidation layer in detail.
5 (a) How is the silicon nitrite used? Explain its deposition variables.
(b) Explain Monolithic and Itybrid Integrated Circuits.

www.aktuonline.com

You might also like

pFad - Phonifier reborn

Pfad - The Proxy pFad of © 2024 Garber Painting. All rights reserved.

Note: This service is not intended for secure transactions such as banking, social media, email, or purchasing. Use at your own risk. We assume no liability whatsoever for broken pages.


Alternative Proxies:

Alternative Proxy

pFad Proxy

pFad v3 Proxy

pFad v4 Proxy