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Accelerator Technique 06

This document summarizes different types of vacuum equipment including various pumps like rotary vane pumps, rotary piston pumps, roots pumps, turbo molecular pumps, diffusion pumps, and getter pumps. It also discusses vacuum gauges such as Pirani gauges and Penning gauges. Finally, it briefly mentions valves that are used with vacuum systems.

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fallo1989
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66 views34 pages

Accelerator Technique 06

This document summarizes different types of vacuum equipment including various pumps like rotary vane pumps, rotary piston pumps, roots pumps, turbo molecular pumps, diffusion pumps, and getter pumps. It also discusses vacuum gauges such as Pirani gauges and Penning gauges. Finally, it briefly mentions valves that are used with vacuum systems.

Uploaded by

fallo1989
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PPT, PDF, TXT or read online on Scribd
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Vacuum equipment

Pumps

Rotary vane pumps


Rotary piston pumps
Roots pumps
Turbo molecular pumps
Diffusion pumps
Getter pumps
Sublimation pumps
Non-evaporable getter pumps

Ion pumps
Electrostatic pumps
Sputter-Ion pumps

Cryogenic pumps

Rotary vane pumps


Pressure range 1 to 105 Pa
10 to 200 m3/h
Rough pumping
Backing for diffusion and turbo pumps

Rotary piston pumps


Roughing pumps
In combination with Roots
30 to 1500 m3/h
Rugged and simple

Roots pumps
Positive displacement blower
3000 to 3500 rpm
Two lobed rotors on parallel shafts
Pumping speed: n x 100 m3/h

Turbo pumps
High speed turbine
Down to 10-8 Pa
Vane speed higher than molecular speed
100 500 m/s
Momentum transfer

Diffusion pumps
Vapor jet
Momentum transfer
on oil collision with
the vapor stream

Ultimate pressure
10-10 Pa

Getter pumps
Gas molecules collide and react with the surface
Sublimation pump is a surface getter pump for
active gases
Titanium: inexpensive, effective, easily sublimed

Non-evaporable getter
Pump by surface adsorption followed by bulk diffusion
High temperatures

The first titanium sublimation getter pump has been assembled


and is being tested in the PBFA-II Integrated Test Facility

Ion pumps
Ions are pumped easily because they are
more reactive with surfaces than neutral
molecules
Bombarding electrons

The pump is started by applying high voltage between the


tube shaped anode and the cathode of the ion pump.
Electrons are accelerated toward the positive anode and are
forced to follow a spiral path in the tube shaped anode
because of the magnetic field. This has the effect of
sweeping out more space and increasing the probability that
an electron will collide with a gas molecule. The positive
ions that are formed in the collisions strike the chemically
active titanium cathode "getter" plate. The ions combine with
the cathode material and eject more cathode material which
ends up on the surface of the anode. This constantly
replenished the film of chemically active cathode material on
the anodes which combines with active gas molecules and
effectively pumps them from the system. This process of
removing chemically active gasses such as Nitrogen,
Oxygen, and Hydrogen is called "gettering".

Inert gasses are handled a little


differently. They are buried in
the pump surfaces. This
happens when they are ionized
and hurled into the cathode.
They penetrate a few layers
and bury themselves in the
cathode lattice structure. They
can be re-emitted when other
ions strike the surface so they
tend to collect where there is
little of this "sputtering" going
on.

Cryogenic pumps
Entrainment of molecules on a cooled
surface by weak van der Waals or
dispersion forces
In principle, any gas can be pumped,
provided that the temperature is low enough
Cryocondensation, cryo sorption and
cryotrapping

Vacuum gauges

Pirani
Thermal conductivity gauge
Heated wire forms one arm of a Wheatsone bridge
Down to 10-3 Pa with a compensating tube

Penning
Cold cathode tube
Magnetic field guides
electrons: more effective
ionization of residual gas
Down to 10-8 Pa
Pressure by measuring
current

i kP
Gauge
constant

1.1 1.4

CF

KF

ISO-K

ISO-F

Valves

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