NMOS Subthreshold Characterization
NMOS Subthreshold Characterization
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Table of Contents
1. Introduction
2. Theoretical Background
3. Experimental Setup
4. Detailed Procedures
5. Expected Results
6. Safety Protocols
7. Analysis Methods
1. Introduction
1.1 Objectives
• Characterize NMOS subthreshold behavior
• Extract key parameters (swing, leakage current)
• Study temperature effects
• Analyze drain voltage dependence
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2. Theoretical Background
Where:
• ID0 = μ0Cox(W/L)(kT/q)²
• n = 1 + (Cd/Cox) ≈ 1.2-2.5
• VT = kT/q ≈ 26mV at 300K
VT 0.6 - 1.2 V
S 60 - 100 mV/decade
IOFF 1 - 100 pA
n 1.2 - 2.5 -
3. Experimental Setup
VDD (5V)
|
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R1 (10kΩ)
|
|--[Ammeter]--+
| |
VGS o--| D
| | NMOS |
R2 G |
| | |
| S |
| | |
GND------------+
2. Measurement Setup:
4. Detailed Procedures
◦ Set VDD = 5V
◦ Connect circuit as shown
◦ Verify all connections
◦ Set temperature to 25°C
2. VGS Sweep Procedure a. Set VDS = 50mV b. Start with VGS = 0V c. Increase VGS in steps:
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0.2 1-10 -9 to -8
0.4 10-100 -8 to -7
0.6 100-1000 -7 to -6
0.8 1000-10000 -6 to -5
25 1.0 65 10
40 0.95 70 50
60 0.90 75 200
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5. Safety Protocols
◦ VDS(max) = 20V
◦ VGS(max) = ±15V
◦ ID(max) = 10mA
◦ Power dissipation = 100mW
2. ESD Protection:
6. Analysis Methods
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2. Threshold Voltage:
3. DIBL Coefficient:
◦ Plot VT vs VDS
◦ DIBL = |∂VT/∂VDS|
◦ Plot VT vs T
◦ Calculate αT = -∂VT/∂T
7. Report Requirements
1. Raw Data Tables
2. Analyzed Parameters
3. Error Analysis
4. Discussion of Results
5. Comparison with Theory
VT 1.0V ±0.2V
S 70mV/dec ±10mV/dec
n 1.5 ±0.3
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EA 0.3eV ±0.1eV
Expected characteristics:
log(ID)
↑
| Strong
| Inversion
| /
| / ~60mV/decade
| / slope
| /
| / Subthreshold
| / Region
| /
| /
| /
|/
+-----------------> VGS
0 VT (≈1V)
Key Features:
B. Temperature Dependence
log(ID)
↑ 70°C
| / 50°C
| / / 30°C
| / / /
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|/ / / ~10mV/decade
|/ / per °C change
|//
|/
+-----------------> VGS
Characteristic Points:
30°C 65 0.98
50°C 75 0.93
70°C 85 0.88
ID (μA)
↑
| VGS = 0.9V
| _________
| /
| /
| / VGS = 0.7V
|/ _________
| /
|/ VGS = 0.5V
| _________
|/
+-----------------> VDS
0 0.5V 1.0V
VT (V)
1.0 +
|\.
0.9 | \.
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| \.
0.8 | \.
| \.
+----------+----> T(°C)
25 50 75
S (mV/dec)
90 + /
| /
80 | /
| /
70 | /
| /
60 +
+----------+----> T(°C)
25 50 75
Expected relationship: S ∝ T
μeff (cm²/V·s)
↑
|\.
| \.
| \.
| \.
| \.
+----------+----> VGS
0 VT 2VT
Expected Features:
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ln(ID)
↑
| 30°C
| / 50°C
| / / 70°C
| / /
| / /
|/ /
| /
| /
+-----------------> 1/kT
• EA ≈ 0.3-0.4 eV in subthreshold
• EA ≈ 0.1-0.2 eV in strong inversion
1. Region-wise Behavior:
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2. Slope Changes:
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3. Critical Observations:
1. VDS Dependence:
2. Curve Characteristics:
▪ Gentle saturation
▪ Lower DIBL effect
▪ More temperature sensitive
▪ Moderate saturation
▪ Visible DIBL effect
▪ Standard behavior
▪ Sharp saturation
▪ Strong DIBL effect
▪ Less temperature sensitive
A. VT Temperature Plot
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Expected Parameters:
1. Expected Relationship:
S(T) = S0(T/T0)
Where:
◦ S0 ≈ 60mV/dec at 300K
◦ Linear increase with temperature
◦ Slope ≈ 0.2mV/dec/°C
2. Quality Metrics:
ln(ID) vs 1/kT
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Expected Features:
2. Extraction Points:
2. Degradation Parameters:
1.0 0% (reference) -
2. Temperature Effects:
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References
1. Taur, Y., & Ning, T. H. (2013). Fundamentals of Modern VLSI Devices
2. Schroder, D. K. (2015). Semiconductor Material and Device Characterization
3. Tsividis, Y. (2011). Operation and Modeling of the MOS Transistor
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