APL_zigzag (1)
APL_zigzag (1)
Recently, images of nanometer-scale magnetic structures angle of the current flow is set at a = 45° and H is applied at
suggested that the magnetization follows the contour of the an angle f = 90° with respect to the uniaxial easy axis of the
edges.1 An important extension of this work on 250 nm wide film. The angle a is obtained with equally spaced electrical
elements with serrated edges (zigzag shaped)2 was demon- contacts at a 45° angle with respect to the magnetic easy axis
strated using Lorentz microscopy. In these elements, the of the element. In this configuration (a = 45° and f = 90°), the
magnetization was shown to exhibit an alternating pattern of magnetization rotates coherently with the applied field (that
easy axis orientations. To have control of the magnetization is, cos u ~ H) and, according to Eq. (1), the response of R
in this manner is of great importance in the development of with respect to H (the so-called transfer curve) will be linear
scalable magnetoresistive (MR) sensors because more com- around zero field. To obtain a uniaxial magnetic element, it is
plicated current- and field-biasing schemes are not required, common to choose a soft magnetic material and to use both
and nanoscale devices based on this technology have become shape and induced anisotropies to ensure the existence of
increasingly important. For example, these types of devices only one anisotropy axis. Therefore, elongated shapes are
have been instrumental in the data storage revolution that has typically used, with attention to the geometrical shape of the
occurred over the past decade.3 Similar MR devices have ends to avoid magnetization curl and vortices.11
also been used as high sensitivity sensors for current-4–6 and Therefore, in this current work, we fabricated single-
magnetization-induced7,8 field imaging. A critical aspect of layer, elongated devices that have a zigzag-shaped magnetic
the design of these devices is the biasing of the magnetiza- layer. The zigzag has a similar aspect ratios to those of Ref.
tion and current flow in order to obtain an antisymmetric, 2, as shown in Fig. 1. The structures were fabricated using
linear response. In this letter, we demonstrate a method of optical lithography and a lift-off process for both the mag-
maintaining a bias between the magnetization and the current netic and contact layers. A 30-nm-thick magnetic layer was
direction using the contour of the element.
In a single-film anisotropic magnetoresistive sensor, the
resistance can be described by9
0003-6951/2004/85(24)/6022/3/$22.00 6022
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Appl. Phys. Lett., Vol. 85, No. 24, 13 December 2004 da Silva et al. 6023
Downloaded 09 Dec 2004 to 132.163.130.151. Redistribution subject to AIP license or copyright, see http://apl.aip.org/apl/copyright.jsp