Phys 446 Solid State Physics Nov 16: M Eb M Eb
Phys 446 Solid State Physics Nov 16: M Eb M Eb
Exciton absorption in Ge
(experiment)
fundamental absorption
(theory)
3. Free carrier absorption 4. Absorption involving impurities
Photoconductivity Evaluate g per unit volume through absorption coefficient α and slab
thickness d:
Phenomenon in which a material becomes more conductive due to
the absorption of electromagnetic radiation
⇒ can write
Have
Diffusion equation for one carrier type
⇒ ∂p
J p = −eD p + peµ p E (holes, one dimension)
∂x
Variation of p(x) in time is given by continuity equation:
∂p 1 ∂J p
= Gp −U p −
∂t e ∂x
Substitute this into the diffusion equation,
generation recombination flow
∂p p1
1) Stationary solution for E = 0: =0
∂t
hole E≠0
∂ p p − p0
2 injection
Dp 2 − =0
∂x τ 'p E=0
(
− x D pτ ' p )
12 0 x
let p - p0 = p1. Then p1 = p − p0 = Ae LD
The excess concentration decays exponentially with x. 1) Stationary solution for a uniform field E ≠ 0:
(
The distance LD = D pτ ' p )
12
is called the diffusion length ∂ 2 p µ p E ∂p1
−
p
− 12 = 0 ⇒ p1 = Ae −γ x LD
12
∂x 2
D p ∂x LD
LD ⎛⎜ D ⎞⎟
Effective diffusion velocity: vD = = µ p ELD
τ ' p ⎜⎝ τ ' p ⎟⎠ s=
Where γ = 1+ s2 − s and
2Dp
12
⎛ D⎞
Diffusion current: J D = ep1vD = ep1 ⎜ ⎟
γ < 1 ⇒ effective diffusion length LD/γ is larger
⎜τ ' ⎟
⎝ p⎠
Summary of the semiconductors section Summary of the semiconductors section
Semiconductors are mostly covalent crystals; They are characterized In a doped semiconductor, many impurities form shallow hydrogen-
by moderate energy gap (~0.5 – 2.5 eV) between the valence and like levels close to the conductive band (donors) or valence band
conduction bands (acceptors), which are completely ionized at room T:
When impurities are introduced, additional states are created in the n = Nd or p = N a
gap. Often these states are close to the bottom of the conduction
band or top of the valence band Conductivity of semiconductors:
Intrinsic carrier concentration: mobility:
= p = ni
Magnetic field effects:
strongly depends on temperature.
Cyclotron resonance is used to obtain information on effective
Fermi level position in intrinsic semiconductor: eB eB
masses. ω ce = - for electrons ω ch = - for holes
me* m h*
pµ h 2 − nµ e 2
Hall coefficient: RH = Hall measurements are
e(nµ e + pµ h ) 2
used to determine carrier concentration and mobility.
In high electric field, the carriers acquire significant energy and
become "hot". This affects mobility and can cause current
Basics of selected semiconductor devices:
instabilities (e.g. Gunn effect caused by negative differential
conductivity due to inter-valley transfer) p-n junctions.
Mechanisms of optical absorption and luminescence: Bipolar transistors.
band-to-band
excitonic Tunnel diodes.
I-V characteristics of a p-n junction Current equation in neutral region (i.e. away from the depletion
layer) is given by the continuity equations:
Assume positive V when it is forward bias:
∂n 1 ∂J n ∂p 1 ∂J p
= Gn − U n + = Gp −U p −
∂t e ∂x ∂t e ∂x
∂n ∂p
For steady case, = =0
∂t ∂t
pn =
Ae
(
x D pτ ' p )1 2 + Be − x (D pτ ' p )1 2 + pn0
N
solution for homogeneous equation inhomogeneous part
As shown earlier, ⇒
The total current is Similarly calculate current at the depletion layer boundary in the p-side
Total current: Omar uses another (equivalent) form :
where
( j p )x= x =
eD p p n 0
[e eV k BT
−1] ( j n )x = x p
=
eDn n p 0
Ln
[e eV k BT
]
−1
n Lp
Holes diffuse through the base; some of them decay. Fundamental limitation of bipolar junction transistor – low frequency –
determined by diffusion of holes (electrons in npn case) into the base
Collector current: I c = I c 0 + αI e (α - fraction of holes that survive)
The high-frequency limit beyond which the device cannot function
Ic0 is very small → ca write Ic ≈ α Ie properly, usually lies in the range of tens – hundreds of MHz
Voltage drop across the load is: Vl = α Rl Ie amplification Other types of transistors are needed for higher-frequency range
Voltage gain dVl dVl dI e αRl I e
= =
dVe dI e dVe kT e
Tunnel diode (very high doping levels) Summary of the semiconductors section
p-n junction: both electrons and holes diffuse across the junction –
potential barrier develops, called built in voltage Vbi :
N N
Vbi = kT ln A 2 D
ni
The junction acts as rectifier. The current vs applied voltage V is
eV kT
a) equilibrium b) Reverse bias - c) Small forward c) Large forward I = I 0 (e eVe kT
− 1) Forward: I ≈ I 0 e e Reverse: I ≈ − I 0
large tunneling bias - some bias - no
current tunneling tunneling Bipolar junction transistor – two back to back junctions: emitter is
current current forward biased, collector is reverse biased
Works as amplifier: when a signal is applied at the emitter, a current
←I-V characteristics pulse passes through the base-collector circuit. The voltage gain is:
dVl dVl dI e αRl I e
tunneling process is very fast – can = =
dVe dI e dVe kT e
operate at high frequencies (e.g. 10 GHz)
Tunnel diode is realized when the doping levels in a p-n junction are
very high, so the junction width is very small – tunneling occur.
A region of negative differential resistance exists in forward bias.
If mirrors are provided and the concentration of the electron hole pairs (called the
injection level) exceeds some critical value → a semiconductor laser
Edge-emitting laser vertical cavity surface-emitting laser
Body is commonly tied to ground (0 V)
• When the gate is at a low voltage
– p-type body is at low voltage
– Source-body and drain-body diodes are OFF (reverse bias)
– Depletion region between n and p bulk: no current can flow, transistor is OFF
• When the gate is at a high voltage
– Positive charge on gate of MOS capacitor
– Negative charge attracted to oxide in the body (under the gate)
– Inverts channel under the gate to n-type
– Now current can flow through this n-type channel between source and drain
– Transistor is ON