Tutorial Sheet - 2
Tutorial Sheet - 2
1. Consider an n‐MOSFET that has a gate oxide thickness tox=12 nm and an electron
mobility of μn=540 cm2 /V‐sec. Find the process transconductance.
2. An n‐MOSFET with W=20 μm and L=0.5 μm is built in a process where k’ n=120 μA/V2
and VTn=0.65 V. The voltages are set to a value of VGS = VDS = 5 V.
(a) Is the transistor saturated or non‐saturated?
5. An n‐MOSFET has a gate oxide with a thickness of tox=120 Å. The p‐type bulk region is
Doped with boron at a density of Na=8x1014 /cm3. It is given that VT0n=0.55 V. Calculate the
body‐bias coefficient γ.
6. For circuit given below with VDD=5 V, k'n= 20 μA/V2 , Vt0= 1V, RL= 200 KΩ, and W/L = 2.
Compute the output voltage when input is Vin (a) 1.5 V (b) 3 V